Description

(2-Cyanopropyl)Ethyl(2-Ethylhexyl)Sulphonium Benzenesulphonate is a specialized organosulfur compound that functions as a highly effective photoacid generator (PAG). This compound matters for its critical role in facilitating precise chemical transformations upon exposure to light, enabling advanced manufacturing processes. It is primarily needed by manufacturers in the electronics and photoresist industries for the production of semiconductors, printed circuit boards, and other microelectronic components.

Application

• Photoresist Formulation: A key component in chemically amplified photoresists for deep-UV (DUV) and other advanced lithography processes in semiconductor fabrication.
• Microelectronics Manufacturing: Used in the patterning of integrated circuits (ICs) and microelectromechanical systems (MEMS).
• Printed Circuit Board (PCB) Production: Employed in photo-imageable solder masks and dielectric layers for high-density interconnect (HDI) boards.
• Advanced Packaging: Facilitates the creation of fine features in fan-out wafer-level packaging (FOWLP) and 3D IC stacking technologies.
• Optical Material Processing: Used in the fabrication of waveguides, optical switches, and other photonic devices.
• Research & Development: Serves as a reagent in academic and industrial R&D for developing new photopolymerization and photo-patterning systems.

Basic Information

Product Name	(2-Cyanopropyl)Ethyl(2-Ethylhexyl)Sulphonium Benzenesulphonate
CAS No.	93962-74-4
Molecular Formula	C20H31NO3S2
Molecular Weight	397.59 g/mol
Synonyms	Benzenesulfonic acid, (2-cyanopropyl)ethyl(2-ethylhexyl)sulfonium; (2-Cyanopropyl)ethyl(2-ethylhexyl)sulfonium benzenesulfonate; Sulfonium, (2-cyanopropyl)ethyl(2-ethylhexyl)-, benzenesulfonate; Photoacid Generator PAG; Sulfonium salt photoinitiator; Ethyl(2-ethylhexyl)(2-cyanopropyl)sulfonium benzenesulfonate
EINECS	Contact for details

Quality Control

Our production of (2-Cyanopropyl)Ethyl(2-Ethylhexyl)Sulphonium Benzenesulphonate adheres to stringent quality protocols to ensure batch-to-batch consistency and performance reliability for critical lithography applications. Each lot is analyzed to meet exacting specifications for purity and ionic contamination levels. Certificates of Analysis (COA) detailing comprehensive testing results are provided to support your quality management systems.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated area at a controlled room temperature (15-25°C). This material is light-sensitive and should be handled under appropriate lighting conditions to prevent premature decomposition. Keep away from heat sources and incompatible materials.

Specification

Item	Specification
Appearance	White to off-white crystalline powder or solid
Identification (IR)	Conforms to structure
Assay (HPLC)	≥ 98.0%
Melting Point	Contact for details
Loss on Drying	≤ 0.5%
Heavy Metals (as Pb)	≤ 10 ppm
Chloride (Cl)	≤ 50 ppm
Sulfate (SO4)	≤ 100 ppm
Related Substances (HPLC)	Individual impurity ≤ 0.5%; Total impurities ≤ 1.0%

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.