Description

T-Butyl 2-[4-(Diphenylsulfonium)Phenoxy]Acetate, Nonaflate Salt is a specialized photoacid generator (PAG) salt, a critical component in advanced photoresist formulations. Its value lies in its ability to generate strong acid upon exposure to light, which catalyzes the chemical changes needed for high-resolution patterning. This compound is essential for manufacturers in the semiconductor and microelectronics industries, particularly for deep ultraviolet (DUV) and other advanced lithography processes requiring precise control over acid diffusion and catalytic activity.

Application

• Advanced Photoresist Formulations: A key photoacid generator for chemically amplified resists (CARs) used in semiconductor manufacturing.
• Deep Ultraviolet (DUV) Lithography: Enables high-resolution patterning for integrated circuits at 248nm and 193nm wavelengths.
• EUV Lithography Ancillary Layers: Potential use in underlayers or top coats for extreme ultraviolet lithography processes.
• Advanced Packaging: Used in fan-out wafer-level packaging (FOWLP) and other fine-pitch interconnect technologies.
• Micro-Electro-Mechanical Systems (MEMS): Facilitates the creation of precise microstructures.
• Optical Component Fabrication: For creating diffraction gratings, waveguides, and other micro-optical elements.
• Research & Development: Serves as a critical reagent for developing next-generation photoresist chemistries and lithographic techniques.

Basic Information

Product Name	T-Butyl 2-[4-(Diphenylsulfonium)Phenoxy]Acetate, Nonaflate Salt
CAS No.	857285-80-4
Molecular Formula	C31H31F9O5S2
Molecular Weight	718.69 g/mol
Synonyms	tert-Butyl 2-[4-(diphenylsulfonio)phenoxy]acetate nonaflate; tert-Butyl 2-(4-(diphenylsulfonium)phenoxy)acetate nonafluorobutanesulfonate; T-Butyl 2-(4-(Diphenylsulfonio)Phenoxy)Acetate Nonaflate; Photoacid Generator PAG; Diphenylsulfonium Phenoxy Acetate PAG Salt; Nonaflate Salt Photoacid Generator; 857285-80-4; Lithography Photoacid
EINECS	Contact for details

Quality Control

Every batch of our T-Butyl 2-[4-(Diphenylsulfonium)Phenoxy]Acetate, Nonaflate Salt is manufactured and tested under strict quality management systems to ensure consistency and performance for critical lithography applications. We provide comprehensive analytical data, including HPLC purity, NMR confirmation, and metal ion analysis, to meet the stringent requirements of the semiconductor industry. Certificates of Analysis (COA) with full traceability are available for all shipments.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at a controlled room temperature (15-25°C). This material is hygroscopic (moisture-sensitive) and should be handled in a dry environment or under inert atmosphere to prevent degradation. Keep away from strong bases and incompatible materials.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to structure
Identification (NMR)	Conforms to structure
Purity (HPLC)	≥ 98.0%
Water Content (KF)	≤ 0.5%
Residue on Ignition	≤ 0.1%
Specific Metals (ICP-MS)	≤ 10 ppm total (Na, K, Ca, Fe, etc.)

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.