Description

Triphenylsulfonium Hexafluorophosphate is a highly specialized photoacid generator (PAG) salt, a critical component in advanced photoresist formulations. Its primary value lies in its ability to generate a strong acid upon exposure to deep ultraviolet (DUV) or electron beam (e-beam) radiation, initiating the chemical changes necessary for high-resolution patterning. This compound is essential for manufacturers and R&D teams in the semiconductor, microelectronics, and advanced printing industries who require precise and reliable materials for photolithography processes.

Application

• Semiconductor Photolithography: A key photoacid generator (PAG) in chemically amplified resists (CARs) for DUV (248nm, 193nm) and e-beam lithography used in chip manufacturing.
• Advanced Packaging: Employed in the patterning processes for fan-out wafer-level packaging (FOWLP) and through-silicon vias (TSVs).
• Micro-Electro-Mechanical Systems (MEMS): Used in the photolithographic patterning of intricate microstructures.
• Photomask Fabrication: Integral to the production of high-precision photomasks using e-beam lithography.
• Printed Circuit Board (PCB) Manufacturing: Applied in the production of high-density interconnect (HDI) boards requiring fine-line circuitry.
• Academic & Industrial R&D: Serves as a research chemical for developing next-generation photoresist materials and studying photoacid generation mechanisms.
• Cationic Polymerization: Acts as an initiator for the UV-induced cationic polymerization of epoxides and vinyl ethers in coatings and adhesives.

Basic Information

Product Name	Triphenylsulfonium Hexafluorophosphate
CAS No.	86481-78-9
Molecular Formula	C18H15F6PS
Molecular Weight	408.34 g/mol
Synonyms	Triphenylsulfonium PF6; TPS-PF6; S,S,S-Triphenylsulfonium Hexafluorophosphate; Triphenylsulfonium Hexafluorophosphate(1-); Photoacid Generator PAG; Sulfonium Salt PAG; (SP-4-1)-Hexafluorophosphate(1-) Triphenylsulfonium
EINECS	Contact for details

Quality Control

Our Triphenylsulfonium Hexafluorophosphate is produced under strict quality management protocols to ensure batch-to-batch consistency and high purity, critical for sensitive photolithography applications. Each lot is accompanied by a comprehensive Certificate of Analysis (COA) detailing purity, impurity profiles, and physical characteristics. We support customer audits and can provide material to meet the stringent requirements of the semiconductor supply chain.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated area at room temperature (15-25°C). This product is hygroscopic (moisture-sensitive) and should be handled under dry conditions, such as in a glovebox or dry room, to prevent decomposition and maintain efficacy.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to structure
Assay (HPLC)	≥ 99.0%
Melting Point	245 - 250 °C (dec.)
Heavy Metals (as Pb)	≤ 10 ppm
Chloride (Cl)	≤ 50 ppm
Sulfate (SO4)	≤ 50 ppm
Loss on Drying	≤ 0.5%
Residue on Ignition	≤ 0.1%

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.