Description

4-Cyclohexyl-2,6-Dimethylpyrylium Hexafluorophosphate is a specialized pyrylium salt primarily used as a photoacid generator (PAG) and a key intermediate in advanced organic synthesis. Its value lies in its ability to efficiently generate strong acids upon exposure to light, which is critical for initiating polymerization and cross-linking reactions in high-performance materials. This compound is essential for manufacturers and R&D laboratories in the electronics, photoresist, and specialty polymer industries seeking reliable and efficient cationic photoinitiators.

Application

• Photoacid Generator (PAG) for Photoresists: A critical component in chemically amplified photoresists used for semiconductor manufacturing and microelectronics lithography.
• Cationic Photoinitiator: Initiates the polymerization of epoxy resins, vinyl ethers, and other monomers under UV light for coatings, inks, and adhesives.
• Organic Synthesis Intermediate: Serves as a versatile building block for synthesizing more complex heterocyclic compounds and functional materials.
• Research & Development: Used in academic and industrial R&D for developing new photopolymerization systems and light-sensitive materials.
• Advanced Material Production: Facilitates the creation of specialty polymers and coatings with tailored properties for optical and electronic applications.

Basic Information

Product Name	4-Cyclohexyl-2,6-Dimethylpyrylium Hexafluorophosphate
CAS No.	84282-38-2
Molecular Formula	C13H19F6OP
Molecular Weight	336.26 g/mol
Synonyms	4-Cyclohexyl-2,6-dimethylpyrylium PF6; 4-Cyclohexyl-2,6-dimethylpyrylium hexafluorophosphate(V); 2,6-Dimethyl-4-cyclohexylpyrylium hexafluorophosphate; Cyclohexyldimethylpyrylium hexafluorophosphate; Photoacid Generator PAG; Cationic Photoinitiator; Pyrylium Salt; Hexafluorophosphate Salt of 4-Cyclohexyl-2,6-dimethylpyrylium
EINECS	Contact for details

Quality Control

Our 4-Cyclohexyl-2,6-Dimethylpyrylium Hexafluorophosphate is manufactured under strict quality management protocols to ensure batch-to-batch consistency and high purity suitable for sensitive applications like photoresist formulation. Each lot is analyzed using advanced techniques including HPLC, NMR, and FTIR. A comprehensive Certificate of Analysis (COA) detailing purity, identity, and impurity profiles is provided with every shipment to support your quality assurance and regulatory needs.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated place at room temperature (15-25°C). This material is hygroscopic (moisture-sensitive) and should be handled under dry conditions to prevent decomposition. Keep away from strong bases and incompatible materials.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to structure
Purity (HPLC)	≥ 98.0%
Water Content (KF)	≤ 0.5%
Residue on Ignition	≤ 0.1%

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.