Description

4-[[(6-Diazo-5,6-Dihydro-5-Oxo-1-Naphthyl)Sulphonyl]Oxy]-γ-[4-[[(6-Diazo-5,6-Dihydro-5-Oxo-1-Naphthyl)Sulphonyl]Oxy]Phenyl]-γ-Methylbenzenebutyric Acid is a specialized, high-purity diazonaphthoquinone (DNQ) derivative, a critical class of compounds in advanced material science. Its primary value lies in its role as a photoactive compound (PAC) and photoacid generator (PAG), essential for initiating precise chemical reactions upon exposure to specific light wavelengths. This compound is indispensable for manufacturers in the semiconductor and electronics industries, where it is used to formulate high-resolution photoresists for microchip fabrication.

Application

• Photoresist Formulation: A key photoactive component in chemical amplification resists (CARs) for deep ultraviolet (DUV) and i-line photolithography in semiconductor manufacturing.
• Advanced Electronics: Used in the production of printed circuit boards (PCBs), flat panel displays, and other microelectronic devices requiring high-precision patterning.
• Photoacid Generation: Serves as a specialized PAG in cationic polymerization and cross-linking reactions triggered by light exposure.
• Specialty Coatings: Applied in the development of light-sensitive coatings for imaging, printing plates, and optical data storage materials.
• Chemical Synthesis: Acts as a versatile intermediate or protecting group reagent in the synthesis of complex organic molecules and polymers.
• Research & Development: Utilized in academic and industrial R&D for exploring new photopolymerization mechanisms and advanced lithographic techniques.

Basic Information

Product Name	4-[[(6-Diazo-5,6-Dihydro-5-Oxo-1-Naphthyl)Sulphonyl]Oxy]-γ-[4-[[(6-Diazo-5,6-Dihydro-5-Oxo-1-Naphthyl)Sulphonyl]Oxy]Phenyl]-γ-Methylbenzenebutyric Acid
CAS No.	74276-38-3
Molecular Formula	C38H26N4O12S2
Molecular Weight	794.76 g/mol
Synonyms	Bis(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonate) ester of 4-[4-Hydroxyphenyl]-4-methylvaleric acid; DNQ derivative; Diazonaphthoquinone sulfonate ester; Photoacid generator 74276-38-3; γ-[4-[[(6-Diazo-5,6-dihydro-5-oxo-1-naphthalenyl)sulfonyl]oxy]phenyl]-γ-methylbenzenebutanoic acid 4-[[(6-diazo-5,6-dihydro-5-oxo-1-naphthalenyl)sulfonyl]oxy] ester; Bis-DNQ PAC; 4-[4-[(6-Diazo-5-oxo-5,6-dihydronaphthalene-1-sulfonyl)oxy]phenyl]-4-methyl-4-[(6-diazo-5-oxo-5,6-dihydronaphthalene-1-sulfonyl)oxy]butyric acid
EINECS	Contact for details

Quality Control

Our production of this high-purity diazonaphthoquinone derivative adheres to stringent quality protocols to ensure batch-to-batch consistency critical for photolithographic performance. Every lot is characterized using advanced analytical techniques including HPLC, NMR, and UV-Vis spectroscopy to verify chemical identity, purity, and photoactive properties. We provide comprehensive Certificates of Analysis (COA) detailing all specifications, and our quality system is designed to meet the exacting standards of the semiconductor supply chain.

Storage

Preserve in a tightly closed container, protected from light. Store in a freezer at -20°C to -10°C under an inert atmosphere (e.g., nitrogen or argon) to minimize thermal degradation and oxidation. Allow the container to reach room temperature in a dark environment before opening to prevent condensation and light exposure. Keep away from heat, sparks, and open flame.

Specification

Item	Specification
Appearance	Yellow to orange crystalline powder
Identification (IR)	Conforms to structure
Purity (HPLC)	≥ 98.0%
Water Content (KF)	≤ 0.5%
Residue on Ignition	≤ 0.1%
Heavy Metals (as Pb)	≤ 10 ppm
Photoactive Response (UV)	Conforms to standard

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.