Description

Tungsten Hexafluoride is an inorganic, highly reactive compound primarily used as a gaseous precursor in advanced material deposition processes. Its high volatility and reactivity make it a critical source material for introducing tungsten into thin films and nanostructures. This compound is essential for manufacturers in the semiconductor, electronics, and specialized coating industries seeking precise and high-purity material inputs.

Application

• Semiconductor Manufacturing: As a key precursor gas in Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) for depositing tungsten metal or tungsten silicide films on silicon wafers.
• Electronics & Microelectronics: For creating diffusion barriers, adhesion layers, and low-resistivity interconnects in integrated circuits and microelectromechanical systems (MEMS).
• Optical & Functional Coatings: Used in the production of wear-resistant, reflective, or electrically conductive coatings on various substrates.
• Nuclear Industry: Employed in uranium enrichment processes and as a fluorinating agent in specific nuclear fuel cycle applications.
• Chemical Synthesis: Acts as a strong fluorinating agent in specialized inorganic and organometallic synthesis to introduce fluorine atoms.
• Research & Development: Serves as a fundamental material in academic and industrial R&D for developing new materials and nanotechnology applications.

Basic Information

Product Name	Tungsten Hexafluoride
CAS No.	7783-82-6
Molecular Formula	WF6
Molecular Weight	297.83 g/mol
Synonyms	Tungsten(VI) fluoride; Tungsten fluoride; Wolfram hexafluoride; Tungsten fluoride (WF6); Hexafluorotungsten; WF6; Perfluorotungsten
EINECS	232-029-1

Quality Control

Our Tungsten Hexafluoride is produced and handled under stringent quality management systems to ensure batch-to-batch consistency and high purity essential for sensitive electronic applications. Each lot is analyzed for critical metallic impurities, moisture (H2O), and other gaseous contaminants. A comprehensive Certificate of Analysis (COA) detailing purity, assay, and impurity profiles is provided with every shipment to support your quality assurance protocols.

Storage

Preserve in a tightly closed, passivated steel cylinder, protected from light and moisture. Store in a cool, well-ventilated area, away from heat sources and incompatible materials such as strong acids/organic solvents and strong alkalis. Due to its highly volatile and gaseous nature, cylinders must be secured upright and checked for leaks regularly. Keep container valves tightly closed when not in use.

Specification

Item	Specification
Appearance	Colorless gas
Assay (WF6)	≥ 99.99%
Moisture (H2O)	≤ 10 ppm
Oxygen (O2)	≤ 5 ppm
Nitrogen (N2)	≤ 20 ppm
Carbon Dioxide (CO2)	≤ 5 ppm
Total Metallic Impurities	≤ 50 ppb

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.