Description

Tantalum Pentafluoride is a high-purity inorganic fluoride compound essential for advanced materials synthesis and chemical vapor deposition processes. Its primary value lies in its role as a critical precursor for depositing tantalum-containing films, which are fundamental to modern electronics and optics. This material is particularly vital for manufacturers and R&D facilities in the semiconductor, optical coating, and specialty chemical industries seeking reliable, high-quality precursors for thin-film applications.

Application

• Chemical Vapor Deposition (CVD) & Atomic Layer Deposition (ALD): A key precursor for depositing tantalum nitride (TaN) barrier layers and tantalum pentoxide (Ta₂O₅) high-k dielectric films in semiconductor manufacturing.
• Optical Thin Films: Used in the production of anti-reflective coatings, interference filters, and other optical components due to its high refractive index when converted to oxide.
• Catalyst Synthesis: Serves as a starting material or catalyst component in specialized fluorination and organic synthesis reactions.
• Glass & Ceramic Modification: Imparts specific optical and chemical resistance properties to specialty glasses and advanced ceramics.
• Laboratory Research: Employed as a high-purity reagent in academic and industrial research for developing new materials and studying fluoride chemistry.
• Metalorganic Precursor Production: Acts as a fundamental building block for synthesizing more complex metalorganic compounds used in advanced deposition techniques.

Basic Information

Product Name	Tantalum Pentafluoride
CAS No.	7783-71-3
Molecular Formula	TaF₅
Molecular Weight	275.94 g/mol
Synonyms	Tantalum(V) fluoride; Pentafluorotantalum; Tantalum fluoride (TaF5); Tantalum pentafluoride, anhydrous; Tantalum fluoride; UNII-4K5O6C5Q5P; EC 232-022-3
EINECS No.	232-022-3

Quality Control

Our Tantalum Pentafluoride is manufactured under strict quality management protocols to ensure batch-to-batch consistency and high purity suitable for demanding applications like semiconductor fabrication. Each lot undergoes comprehensive analytical testing, including assay by titration and impurity profiling via ICP-MS. A Certificate of Analysis (COA) detailing all specifications and test results is provided with every shipment to support your quality assurance and regulatory compliance needs.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, well-ventilated area at room temperature (15-25°C). Due to its hygroscopic (moisture-sensitive) nature, containers must be kept tightly sealed under an inert atmosphere (e.g., argon or nitrogen) when not in use to prevent hydrolysis and degradation. Keep away from strong bases and incompatible materials.

Specification

Item	Specification
Appearance	White to off-white crystalline solid or lumps
Identification (IR)	Conforms
Assay (TaF₅)	≥ 99.0%
Assay (Ta)	≥ 65.5%
Chloride (Cl)	≤ 100 ppm
Sulfate (SO₄)	≤ 100 ppm
Heavy Metals (as Pb)	≤ 20 ppm
Iron (Fe)	≤ 20 ppm
Niobium (Nb)	≤ 500 ppm
Moisture (Karl Fischer)	≤ 0.5%

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.