Description

(Chlorophenyl)[[(Chlorophenyl)Thio]Phenyl]Phenylsulphonium Hexafluorophosphate(1-) is a specialized onium salt, a key photoacid generator (PAG) in advanced chemical amplification systems. Its core value lies in its high photosensitivity and thermal stability, which are critical for generating strong acids upon exposure to specific wavelengths of light. This compound is essential for manufacturers in the electronics and advanced materials sectors, particularly for high-resolution photoresists used in semiconductor fabrication and UV-curable coatings.

Application

• Photoresist Formulations: A critical photoacid generator (PAG) for chemically amplified resists (CARs) in deep-ultraviolet (DUV), KrF, and ArF lithography for semiconductor manufacturing.
• UV-Curing Systems: Used as an efficient cationic photoinitiator in UV-curable inks, coatings, and adhesives, enabling rapid curing and enhanced material properties.
• Advanced Polymer Synthesis: Serves as a catalyst or initiator in controlled cationic polymerization reactions for specialty polymers.
• Microelectronics Packaging: Employed in the patterning and processing of dielectric materials and interlayer dielectrics.
• Optical Materials: Used in the fabrication of waveguides, optical switches, and other photonic components requiring precise acid-catalyzed reactions.
• Research & Development: A valuable reagent for academic and industrial R&D in photochemistry, materials science, and novel lithographic techniques.

Basic Information

Product Name	(Chlorophenyl)[[(Chlorophenyl)Thio]Phenyl]Phenylsulphonium Hexafluorophosphate(1-)
CAS No.	68156-09-2
Molecular Formula	C24H17Cl2F6PS2
Molecular Weight	585.38 g/mol
Synonyms	Bis(4-chlorophenyl)(4-(phenylthio)phenyl)sulfonium hexafluorophosphate; (4-Chlorophenyl)[4-[(4-chlorophenyl)thio]phenyl]phenylsulfonium hexafluorophosphate; Sulfonium, bis(4-chlorophenyl)[4-(phenylthio)phenyl]-, hexafluorophosphate(1-); Photoacid Generator PAG; Sulfonium Salt PAG; CPI-210
EINECS	Contact for details

Quality Control

Our production of (Chlorophenyl)[[(Chlorophenyl)Thio]Phenyl]Phenylsulphonium Hexafluorophosphate(1-) adheres to stringent quality management systems to ensure batch-to-batch consistency and high purity, which is paramount for lithographic performance. Each lot undergoes comprehensive analytical testing, including HPLC for purity and assay, NMR for structural confirmation, and ICP-MS for trace metal analysis. Certificates of Analysis (COA) detailing all specifications are provided with every shipment.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at 15-25°C. This material is hygroscopic (moisture-sensitive) and should be handled under dry, inert conditions to prevent decomposition. Keep away from strong bases and incompatible materials.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to reference spectrum
Identification (NMR)	Conforms to structure
Assay (HPLC)	≥ 98.0%
Melting Point	Contact for details
Loss on Drying	≤ 0.5%
Residue on Ignition	≤ 0.1%
Heavy Metals (as Pb)	≤ 10 ppm

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.