Description

Bis(Isopropylcyclopentadienyl)Hafnium Dichloride is a highly specialized organometallic compound of significant industrial importance. This compound serves as a critical precursor in advanced materials science, particularly for the synthesis of high-performance hafnium-based thin films. It is essential for manufacturers and R&D facilities in the semiconductor and specialty chemical sectors who require ultra-high purity materials for vapor deposition processes. Its tailored molecular structure enables precise control over film properties in next-generation electronic devices.

Application

• Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD): A key precursor for depositing hafnium oxide (HfO₂) and hafnium silicate high-k dielectric films in semiconductor manufacturing.
• Advanced Microelectronics: Enables the production of gate dielectrics for transistors, contributing to device miniaturization and enhanced performance.
• Catalysis Research: Investigated as a catalyst or catalyst precursor in specialized organic synthesis and polymerization reactions.
• Materials Science R&D: Used in the development of novel hafnium-containing ceramics, composites, and nanostructured materials.
• Optical Coatings: Potential use in creating thin films for specialized optical applications requiring specific refractive indices.

Basic Information

Product Name	Bis(Isopropylcyclopentadienyl)Hafnium Dichloride
CAS No.	66349-80-2
Molecular Formula	C₁₆H₂₂Cl₂Hf
Molecular Weight	467.85 g/mol
Synonyms	Bis(isopropylcyclopentadienyl)hafnium(IV) dichloride; Hafnocene dichloride derivative; (iPrCp)₂HfCl₂; Diisopropylcyclopentadienylhafnium dichloride; Bis(1-isopropyl-2,4-cyclopentadien-1-yl)hafnium dichloride; Hf(iPrCp)₂Cl₂; Organohafnium compound
EINECS	Contact for details

Quality Control

Our Bis(Isopropylcyclopentadienyl)Hafnium Dichloride is manufactured under stringent conditions to meet the exacting purity standards required for semiconductor-grade precursors. Quality is assured through comprehensive analytical techniques including NMR, elemental analysis (C/H), and inductively coupled plasma mass spectrometry (ICP-MS) to control metallic impurities. A Certificate of Analysis (COA) detailing lot-specific purity, identity, and impurity profiles is provided with every shipment to ensure traceability and compliance with your internal specifications.

Storage

Preserve in a tightly closed container, protected from light. Store under an inert atmosphere (argon or nitrogen) at room temperature (15-25°C) in a cool, dry, and well-ventilated place. This material is both hygroscopic and easily oxidized; exposure to air and moisture must be minimized to preserve purity and performance. Keep away from incompatible materials.

Specification

Item	Specification
Appearance	Off-white to beige crystalline powder
Identification (IR)	Conforms to structure
Assay (Hf content)	≥ 99.9% (metals basis)
Purity (by NMR)	≥ 98.0%
Chloride Content	Theoretical
Trace Metals (ICP-MS)	< 100 ppm total

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.