Description

Triphenylsulfonium Trifluoromethanesulfonate is a high-purity photoacid generator (PAG) salt, a critical component in advanced photoresist formulations. Its primary value lies in its ability to generate a strong acid upon exposure to deep ultraviolet (DUV) or electron beam (e-beam) radiation, initiating the chemical changes necessary for high-resolution patterning. This compound is essential for manufacturers in the semiconductor and microelectronics industries who require precise and reliable materials for photolithography processes at sub-micron nodes.

Application

• Semiconductor Photolithography: A key photoacid generator (PAG) in chemically amplified resists (CARs) for DUV (248nm, 193nm) and e-beam lithography.
• Advanced Packaging: Used in the fabrication of interconnects, redistribution layers, and through-silicon vias (TSVs).
• Microelectromechanical Systems (MEMS): Enables high-aspect-ratio patterning for sensor and actuator manufacturing.
• Photomask Production: Critical for creating the high-precision master templates used in chip fabrication.
• Research & Development: Serves as a benchmark compound in academic and industrial labs developing next-generation photoresist chemistries.
• Specialty Polymers: Can be used as an initiator or catalyst in cationic polymerization reactions for specialty coatings and materials.

Basic Information

Product Name	Triphenylsulfonium Trifluoromethanesulfonate
CAS No.	66003-78-9
Molecular Formula	C20H15F3O3S2
Molecular Weight	424.45 g/mol
Synonyms	Triphenylsulfonium Triflate; Trifluoromethanesulfonic Acid Triphenylsulfonium Salt; TPS-Tf; Triphenylsulfonium Trifluoromethanesulphonate; S-(Triphenyl)-Trifluoromethanesulfonothioate; Photoacid Generator PAG; Triphenylsulfonium Salt of Triflic Acid
EINECS	Contact for details

Quality Control

Our Triphenylsulfonium Trifluoromethanesulfonate is manufactured under strict quality management systems to ensure batch-to-batch consistency and high purity, critical for sensitive lithographic applications. Each lot undergoes comprehensive analysis including HPLC for purity and impurity profiling, NMR for structural confirmation, and ICP-MS for trace metal analysis. Certificates of Analysis (COA) detailing all specifications are provided with every shipment.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at 15-25°C. This material is hygroscopic (moisture-sensitive) and must be kept in a desiccated environment. Use appropriate ventilation and handling procedures to minimize exposure to light and atmospheric moisture.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to structure
Assay (HPLC)	≥ 99.0%
Water Content (KF)	≤ 0.5%
Residue on Ignition	≤ 0.1%
Heavy Metals (as Pb)	≤ 10 ppm
Specific Impurities (HPLC)	Individual ≤ 0.1%, Total ≤ 0.5%

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.