Description

Bis[Bis(Trimethylsilyl)Amino]Tin Ii is a highly reactive organotin compound used as a versatile precursor in advanced materials synthesis. This compound is valued for its role in depositing high-purity tin-containing films and facilitating precise chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. It is essential for researchers and manufacturers in the semiconductor, nanotechnology, and specialty chemical industries seeking to develop next-generation electronic and optical materials.

Application

• Semiconductor Manufacturing: As a volatile precursor for Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) of tin-containing thin films.
• Nanomaterial Synthesis: For the controlled growth of tin-based nanoparticles, nanowires, and quantum dots with specific electronic properties.
• Catalysis: Acting as a catalyst or catalyst precursor in specialized organic transformations and polymerization reactions.
• Surface Functionalization: Used to modify material surfaces with silylamino-tin groups to alter wettability, adhesion, or reactivity.
• Polymer Additive: As a potential cross-linking agent or stabilizer in the formulation of high-performance polymers and silicones.
• Research & Development: Serving as a key starting material in academic and industrial labs for exploring new organometallic chemistry and materials science.

Basic Information

Product Name	Bis[Bis(Trimethylsilyl)Amino]Tin Ii
CAS No.	59863-13-7
Molecular Formula	C12H36N2Si4Sn
Molecular Weight	435.51 g/mol
Synonyms	Bis[bis(trimethylsilyl)amino]tin(II); Tin(II) bis[bis(trimethylsilyl)amide]; Stannylene, bis[bis(trimethylsilyl)amino]-; Hexamethyldisilazane tin(II) derivative; Sn[N(SiMe3)2]2; Tin bis(hexamethyldisilazide); (Me3Si)2N-Sn-N(SiMe3)2; TBTMSA
EINECS	Contact for details

Quality Control

Our Bis[Bis(Trimethylsilyl)Amino]Tin Ii is produced and handled under strict quality protocols to ensure batch-to-batch consistency and high purity for sensitive applications like semiconductor fabrication. Each lot is supported by a comprehensive Certificate of Analysis (COA) detailing key parameters such as assay, identity, and impurity profiles. We adhere to relevant industry standards for high-purity organometallic precursors.

Storage

Preserve in a tightly closed container, protected from light. Store under an inert atmosphere (argon or nitrogen) in a cool, dry, and well-ventilated area, away from heat and ignition sources. Due to its properties of being easily oxidized and highly volatile, it is recommended to store at temperatures between 2°C and 8°C for long-term stability. Allow the sealed container to reach ambient temperature before opening to minimize moisture ingress and pressure changes.

Specification

Item	Specification
Appearance	Colorless to pale yellow liquid
Identification (IR)	Conforms to structure
Assay (Sn content)	≥ 95.0%
Purity (GC)	≥ 98.0%
Density (at 20°C)	~1.0 g/mL

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.