Description

(tert-Amylimino)Tris(Dimethylamino)Tantalum is a highly specialized organometallic precursor compound, primarily utilized in advanced thin-film deposition processes. Its value lies in its role as a volatile, high-purity source for tantalum, enabling precise control over film composition and properties in demanding semiconductor and optical applications. This product is essential for manufacturers and R&D facilities in the electronics, photovoltaics, and specialty coatings industries seeking to deposit high-performance tantalum-containing films.

Application

• Atomic Layer Deposition (ALD): A key precursor for depositing tantalum nitride (TaN), tantalum oxide (Ta2O5), and other tantalum-based thin films for semiconductor gate dielectrics and diffusion barriers.
• Chemical Vapor Deposition (CVD): Used in both thermal and plasma-enhanced CVD processes to create uniform, conformal coatings on complex geometries for microelectronics.
• Advanced Semiconductor Fabrication: Enables the production of next-generation logic and memory devices, including DRAM capacitors and advanced interconnects, due to its excellent step coverage and low impurity levels.
• Optical and Electro-Optic Coatings: Serves as a precursor for high-refractive-index films used in optical waveguides, anti-reflective coatings, and electro-optic modulators.
• Research & Development: A critical material for academic and industrial R&D focused on novel materials synthesis, surface science, and the development of new deposition methodologies.
• Protective and Hard Coatings: Used to deposit wear-resistant and corrosion-resistant tantalum carbide (TaC) or composite coatings on precision tools and components.

Basic Information

Product Name	(tert-Amylimino)Tris(Dimethylamino)Tantalum
CAS No.	440081-38-9
Molecular Formula	C14H36N5Ta
Molecular Weight	445.39 g/mol
Synonyms	Tris(dimethylamido)(tert-amylimido)tantalum(V); Tantalum(V) tris(dimethylamide) tert-pentylimide; PDMAT; (t-Pentylimido)tris(dimethylamido)tantalum; Ta(NMe2)3(Nt-Amyl); Tert-amylimido-tris(dimethylamido)tantalum; ALD/CVD Tantalum Precursor; TAIMATA
EINECS	Contact for details

Quality Control

Every batch of (tert-Amylimino)Tris(Dimethylamino)Tantalum is manufactured and analyzed under strict quality management systems to ensure ultra-high purity and consistency required for semiconductor-grade applications. Our rigorous quality testing includes advanced analytical techniques to verify composition and minimize metallic impurities. A comprehensive Certificate of Analysis (COA) detailing purity, assay, and impurity profiles is provided with each shipment to support your quality assurance protocols.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated area at room temperature (15-25°C). This compound is hygroscopic (moisture-sensitive) and must be handled under an inert atmosphere (argon or nitrogen) to prevent decomposition. Keep away from strong oxidizing agents.

Specification

Item	Specification
Appearance	Clear, yellow to amber liquid
Identification (NMR)	Conforms to structure
Purity (NMR / GC)	≥ 99.0%
Assay (Ta content)	Contact for details
Density (at 20°C)	~1.2 g/mL
Volatility	Suitable for vapor delivery
Metallic Impurities (ICP-MS)	< 10 ppm total

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.