Description

Triphenylsulfanium 2-(Trifluoromethyl)Benzene-1-Sulfonate is a specialized sulfonium salt photoacid generator (PAG) with a high-performance trifluoromethylated benzenesulfonate counterion. This compound matters for its critical role in enabling advanced photolithography processes, particularly in the production of next-generation semiconductor devices and high-resolution photoresists. It is primarily needed by manufacturers in the electronics, microelectronics, and advanced materials sectors who require precise control over acid generation for patterning at nanometer scales.

Application

• Chemical Amplification Photoresists (CARs): A key photoacid generator (PAG) component in deep ultraviolet (DUV), extreme ultraviolet (EUV), and electron-beam lithography for semiconductor manufacturing.
• Advanced Microfabrication: Used in the patterning of integrated circuits (ICs), memory chips, and microprocessors requiring sub-micron feature resolution.
• Polymer and Material Science: Acts as an acid catalyst precursor in photo-initiated cationic polymerization and cross-linking reactions for specialty coatings and polymers.
• Optical Materials: Employed in the fabrication of photonic crystals, waveguides, and other optical components through photo-patterning techniques.
• Research & Development: Serves as a valuable reagent in academic and industrial R&D for developing new photoresist formulations and studying photoacid generation mechanisms.

Basic Information

Product Name	Triphenylsulfanium 2-(Trifluoromethyl)Benzene-1-Sulfonate
CAS No.	425670-97-9
Molecular Formula	C25H19F3O3S2
Molecular Weight	488.54 g/mol
Synonyms	Triphenylsulfonium α,α,α-Trifluoro-o-toluenesulfonate; Triphenylsulfonium 2-(Trifluoromethyl)benzenesulfonate; Triphenylsulfonium o-Trifluoromethylbenzenesulfonate; TPS-OTf; Photoacid Generator PAG; Sulfonium Salt Photoinitiator; (2-(Trifluoromethyl)phenyl)sulfonic acid triphenylsulfonium salt
EINECS	Contact for details

Quality Control

Our Triphenylsulfanium 2-(Trifluoromethyl)Benzene-1-Sulfonate is manufactured under strict quality management systems to ensure batch-to-batch consistency and high purity, essential for sensitive photolithography applications. Each lot undergoes comprehensive analytical testing, including HPLC for purity and NMR for structural confirmation. Certificates of Analysis (COA) detailing all specifications are provided with every shipment to support your quality assurance protocols.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at a controlled room temperature (15-25°C). This material is light-sensitive (store away from light) and hygroscopic (moisture-sensitive). Keep the container tightly sealed under an inert atmosphere such as nitrogen or argon to prevent moisture absorption and decomposition.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to structure
Purity (HPLC)	≥ 98.0%
Melting Point	Contact for details
Heavy Metals (as Pb)	≤ 10 ppm
Residual Solvents (GC)	Meets ICH guidelines
Water Content (KF)	≤ 0.5%

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.