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Bis(Cyclopentadienyl)Dimethylhafnium CAS NO 37260-88-1
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CAS No.:37260-88-1
Grade:Pharmacy Grade
Content:99.9%
Brand:Customizable
Packaging:Customizable
Description
Bis(Cyclopentadienyl)Dimethylhafnium CAS NO 37260-88-1 is a highly reactive organometallic compound belonging to the metallocene family, specifically a Group 4 transition metal complex. This compound is a critical precursor in advanced materials science, valued for its role in depositing high-purity hafnium-containing thin films. It is primarily needed by manufacturers and R&D facilities in the semiconductor, specialty chemical, and catalysis sectors for applications requiring precise atomic-level deposition and polymerization control.
Application
- Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD): A key precursor for depositing hafnium oxide (HfO₂) high-k dielectric films in advanced semiconductor gate stacks and memory devices.
- Catalysis Research: Serves as a catalyst or catalyst precursor in olefin polymerization and other organometallic transformations, exploring structure-activity relationships.
- Specialty Materials Synthesis: Used in the synthesis of novel organohafnium compounds and hafnium-based polymers with tailored properties.
- Thin Film Coatings: Enables the production of corrosion-resistant, optical, or protective hafnium-based coatings on various substrates.
- Academic and Industrial R&D: A fundamental reagent for studying organometallic chemistry, reaction mechanisms, and new material development.
Basic Information
| Product Name | Bis(Cyclopentadienyl)Dimethylhafnium |
| CAS No. | 37260-88-1 |
| Molecular Formula | C₁₂H₁₄Hf |
| Molecular Weight | 328.89 g/mol |
| Synonyms | Dimethylbis(cyclopentadienyl)hafnium(IV); Cp₂Hf(CH₃)₂; Bis(η⁵-cyclopentadienyl)dimethylhafnium; Hafnocene dimethyl; Dimethylhafnocene; HfCp₂Me₂; Organohafnium precursor; ALD/CVD Hafnium precursor |
| EINECS | Contact for details |
Quality Control
Our Bis(Cyclopentadienyl)Dimethylhafnium is manufactured and handled under stringent quality protocols to ensure batch-to-batch consistency and high purity, critical for sensitive deposition processes. Quality is verified through advanced analytical techniques including NMR, GC-MS, and elemental analysis. A comprehensive Certificate of Analysis (COA) detailing purity, identity, and impurity profiles is provided with each shipment to support your quality assurance and process validation requirements.
Storage
Preserve in a tightly closed container, protected from light. Store under an inert atmosphere (argon or nitrogen) at temperatures between 2°C and 8°C (refrigerated) to maintain stability and prevent decomposition. This compound is moisture-sensitive (hygroscopic) and easily oxidized; therefore, it must be handled exclusively in a controlled, dry, and oxygen-free environment using appropriate Schlenk line or glovebox techniques.
Specification
| Item | Specification |
|---|---|
| Appearance | Yellow to orange crystalline solid or solution |
| Identification (NMR) | Conforms to structure |
| Purity (Assay by NMR/GC) | ≥ 95.0% |
| Hafnium (Hf) Content | Contact for details |
| Solvent (if supplied as solution) | Toluene, Heptane, or as specified |
| Concentration (if supplied as solution) | 0.1 M - 0.5 M, or as specified |
Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.
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