Description

(4-Methoxy-3,5-Dimethylphenyl)Dimethylsulfonium Bis((Perfluorobutyl)Sulfonyl)Amide is a specialized ionic liquid salt, also known as a sulfonium-based photoacid generator (PAG) precursor. This compound matters for its role in advanced photolithography, where it serves as a key component in chemically amplified resists for the production of semiconductors and microelectronics. Industries requiring high-precision patterning, such as semiconductor manufacturing, advanced optics, and nanotechnology R&D, need this high-purity material to achieve superior resolution and process control.

Application

• Semiconductor Photolithography: A critical photoacid generator (PAG) component in deep ultraviolet (DUV) and extreme ultraviolet (EUV) photoresists for advanced node chip manufacturing.
• Advanced Microelectronics Fabrication: Used in the patterning of intricate circuit designs on silicon wafers and other substrates.
• Optical Component Manufacturing: Enables the precise etching of micro-optical elements, waveguides, and diffractive optical structures.
• Nanotechnology Research & Development: Serves as a functional material for creating nanoscale patterns and structures in academic and industrial R&D settings.
• Polymer & Material Science: Acts as an initiator or catalyst in cationic polymerization reactions and surface modification processes.
• Specialty Chemical Synthesis: Utilized as a building block or intermediate for synthesizing other complex sulfonium salts and fluorinated ionic liquids.

Basic Information

Product Name	(4-Methoxy-3,5-Dimethylphenyl)Dimethylsulfonium Bis((Perfluorobutyl)Sulfonyl)Amide
CAS No.	2222384-16-7
Molecular Formula	C21H22F18NO6S3
Molecular Weight	846.58 g/mol
Synonyms	Dimethyl(4-methoxy-3,5-dimethylphenyl)sulfanium bis(perfluorobutanesulfonyl)azanide; (4-Methoxy-3,5-dimethylphenyl)dimethylsulfonium bis(nonafluorobutanesulfonyl)imide; Sulfonium PAG Salt; Photoacid Generator Ionic Liquid; Sulfonium Bis(perfluorobutylsulfonyl)imide Salt; DMPDMS-TFSI Analog (C4); [4-MeO-3,5-Me2PhSMe2][C4F9SO2)2N]
EINECS	Contact for details

Quality Control

Our production of (4-Methoxy-3,5-Dimethylphenyl)Dimethylsulfonium Bis((Perfluorobutyl)Sulfonyl)Amide adheres to stringent quality protocols suitable for semiconductor-grade materials. Each batch undergoes rigorous analytical testing, including HPLC, NMR, and ICP-MS, to ensure ultra-high purity and minimal metallic impurities. Certificates of Analysis (COA) detailing lot-specific results are provided to guarantee traceability, consistency, and compliance with the exacting standards of the microelectronics industry.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at a controlled room temperature (15-25°C). This material is hygroscopic (moisture-sensitive) and should be handled under a dry, inert atmosphere (e.g., nitrogen or argon) when opening the primary container to prevent degradation. For long-term storage, consider desiccated conditions.

Specification

Item	Specification
Appearance	White to off-white crystalline powder or solid
Identification (IR)	Conforms to structure
Purity (HPLC)	≥ 98.0% (Area %)
Water Content (KF)	≤ 0.5% w/w
Residual Solvents (GC)	Meets ICH guidelines
Heavy Metals (ICP-MS)	≤ 10 ppm total
Anion Content (IC)	Conforms

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.