Description

(Difluoromethyl)Bis(2,5-Dimethylphenyl)Sulfonium Tetrafluoroborate is a specialized sulfonium salt photoacid generator (PAG) designed for advanced photoresist formulations. This compound is critical for enabling high-resolution patterning in the manufacturing of semiconductors and microelectronics. It is primarily required by R&D chemists and process engineers in the photolithography, electronics, and advanced materials sectors.

Application

• Photolithography: A key photoacid generator (PAG) component in chemically amplified resists (CARs) for deep ultraviolet (DUV) and extreme ultraviolet (EUV) lithography processes.
• Semiconductor Fabrication: Enables the creation of sub-micron and nanometer-scale circuit patterns on silicon wafers for integrated circuits (ICs).
• Advanced Electronics: Used in the production of flat-panel displays, micro-electro-mechanical systems (MEMS), and other precision electronic components.
• Polymer Chemistry: Serves as a cationic initiator for the polymerization of specific monomers or in cross-linking reactions for specialty polymers.
• Organic Synthesis: Acts as a versatile reagent for introducing difluoromethyl groups or as a catalyst in various fluorination and coupling reactions.
• Material Science R&D: Employed in the development of novel photosensitive materials and coatings with tailored properties.

Basic Information

Item	Detail
Product Name	(Difluoromethyl)Bis(2,5-Dimethylphenyl)Sulfonium Tetrafluoroborate
CAS No.	2133476-51-2
Molecular Formula	C₁₇H₁₉F₆BS
Molecular Weight	380.20 g/mol
Synonyms	Bis(2,5-dimethylphenyl)(difluoromethyl)sulfonium tetrafluoroborate; (Difluoromethyl)bis(2,5-dimethylphenyl)sulfanium tetrafluoroborate; Photoacid Generator PAG; Sulfonium Salt PAG; Difluoromethyl Sulfonium Salt; Lithography PAG; EUV Photoacid Generator
EINECS	Contact for details

Quality Control

Our (Difluoromethyl)Bis(2,5-Dimethylphenyl)Sulfonium Tetrafluoroborate is manufactured under strict quality management systems. Each batch undergoes comprehensive analytical testing, including HPLC for purity and NMR for structural confirmation, to ensure it meets the stringent requirements of the electronics industry. Certificates of Analysis (COA) with detailed specifications are available upon request.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at 15-25°C. This material is hygroscopic (moisture-sensitive) and should be handled under a dry inert atmosphere (e.g., nitrogen or argon) to prevent degradation. Keep away from incompatible materials.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to structure
Purity (HPLC)	≥ 98.0%
Water Content (KF)	≤ 0.5%
Residue on Ignition	≤ 0.1%
Heavy Metals (as Pb)	≤ 10 ppm

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.