Description

Sulfonium, Octadecyl(2-Oxo-2-Phenylethyl)Propyl-, (Oc-6-11)-Hexafluoroantimonate(1-) (9Ci) is a specialized photoacid generator (PAG) salt, a critical component in advanced photoresist formulations for high-resolution lithography. Its core value lies in generating a strong acid upon exposure to light, which catalyzes the chemical changes needed to create precise micro- and nano-scale patterns on semiconductor wafers. This compound is essential for manufacturers in the electronics and semiconductor industries, particularly for producing integrated circuits, microelectromechanical systems (MEMS), and other advanced microelectronic devices.

Application

• Advanced Semiconductor Lithography: A key photoacid generator (PAG) in chemically amplified photoresists (CARs) for deep ultraviolet (DUV), extreme ultraviolet (EUV), and electron-beam (e-beam) lithography processes.
• Microelectronics Fabrication: Enables the patterning of high-density interconnects, transistor gates, and other critical features in integrated circuit (IC) manufacturing.
• Photopolymerization Catalyst: Used in UV-curable coatings, inks, and adhesives where a strong acid catalyst is required to initiate cross-linking reactions upon exposure.
• Specialty Polymer Synthesis: Acts as an initiator or catalyst in cationic polymerization reactions for producing specialized polymers with specific thermal or chemical properties.
• Optical Component Manufacturing: Employed in the fabrication of photonic devices, waveguides, and micro-optical elements requiring high-precision etching.
• Research & Development: Serves as a critical reagent in academic and industrial R&D for developing next-generation photoresist materials and lithographic techniques.

Basic Information

Product Name	Sulfonium, Octadecyl(2-Oxo-2-Phenylethyl)Propyl-, (Oc-6-11)-Hexafluoroantimonate(1-) (9Ci)
CAS No.	259879-80-6
Molecular Formula	C29H51F6O2SSb
Molecular Weight	Contact for details
Synonyms	Octadecyl(2-oxo-2-phenylethyl)propylsulfonium hexafluoroantimonate; Propyl(2-oxo-2-phenylethyl)octadecylsulfonium hexafluoroantimonate; Sulfonium, octadecyl(2-oxo-2-phenylethyl)propyl-, hexafluoroantimonate(1-); Phenylglyoxylate Sulfonium Salt PAG; Photoacid Generator 259879-80-6; Sulfonium Salt PAG; Triphenylsulfonium hexafluoroantimonate derivative; (OC-6-11)-Hexafluoroantimonate(1-) octadecyl(2-oxo-2-phenylethyl)propylsulfonium
EINECS	Contact for details

Quality Control

Our production of this high-purity photoacid generator adheres to strict quality management protocols to ensure batch-to-batch consistency and performance reliability for critical lithography applications. Each lot is characterized using advanced analytical techniques including HPLC, NMR, and ICP-MS to verify chemical identity, purity, and control metallic impurities. Certificates of Analysis (COA) detailing all specifications and test results are provided and can be tailored to meet specific customer requirements.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated area at a controlled room temperature (15-25°C). This material is hygroscopic (moisture-sensitive) and light-sensitive; containers must be kept tightly sealed under an inert atmosphere (e.g., nitrogen or argon) after opening to prevent degradation. Keep away from incompatible materials such as strong bases and reducing agents.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to reference spectrum
Identification (NMR)	Conforms to structure
Purity (HPLC)	≥ 98.0%
Melting Point	Contact for details
Heavy Metals (ICP-MS)	< 10 ppm
Moisture Content (KF)	< 0.5%
Residue on Ignition	< 0.1%

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.