Description

Sulfonium, Ethylhexadecyl(2-Oxo-2-Phenylethyl)-, (Oc-6-11)-Hexafluoroantimonate(1-) (9Ci) CAS NO 259879-78-2 is a specialized sulfonium salt photoacid generator (PAG) designed for advanced photoresist formulations. This compound is valued for its high photosensitivity and thermal stability, enabling precise patterning in microelectronics manufacturing. It is a critical component for producers of photoresists used in semiconductor fabrication, advanced packaging, and printed circuit board (PCB) lithography.

Application

• Chemical Amplified Resist (CAR) Formulations: As a key photoacid generator for deep ultraviolet (DUV), KrF, and ArF lithography processes.
• Semiconductor Manufacturing: For creating high-resolution patterns on silicon wafers in the production of integrated circuits (ICs).
• Advanced Packaging: Used in fan-out wafer-level packaging (FOWLP) and through-silicon via (TSV) technologies.
• Printed Circuit Board (PCB) Fabrication: In photoresists for imaging fine-line circuits and solder masks.
• Micro-Electro-Mechanical Systems (MEMS): For patterning intricate mechanical structures at the micron scale.
• Optical Component Fabrication: In the production of diffraction gratings, waveguides, and other micro-optical elements.
• Research & Development: Serving as a reagent for developing next-generation photopolymer materials and lithographic processes.

Basic Information

Product Name	Sulfonium, Ethylhexadecyl(2-Oxo-2-Phenylethyl)-, (Oc-6-11)-Hexafluoroantimonate(1-) (9Ci)
CAS No.	259879-78-2
Molecular Formula	C26H44F6OSSb
Molecular Weight	634.45 g/mol
Synonyms	Ethylhexadecyl(2-oxo-2-phenylethyl)sulfonium hexafluoroantimonate; (2-Oxo-2-phenylethyl)ethylhexadecylsulfonium hexafluoroantimonate; Sulfonium PAG; Photoacid Generator 259879-78-2; Sulfonium salt photoinitiator; Hexafluoroantimonate sulfonium salt; Ethylhexadecyl(phenacyl)sulfonium hexafluoroantimonate; Phenylglyoxylate sulfonium salt PAG
EINECS	Contact for details

Quality Control

Every batch of our sulfonium salt photoacid generator is produced and tested under strict quality management protocols to ensure consistency and performance for critical lithographic applications. We provide comprehensive Certificates of Analysis (COA) with each shipment, detailing key parameters such as purity, assay, and impurity profiles. Our quality system is designed to meet the stringent requirements of the semiconductor supply chain.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at a controlled room temperature (15-25°C). This material is hygroscopic (moisture-sensitive) and light-sensitive; containers must be kept tightly sealed in a dry environment and opened under inert atmosphere or controlled humidity conditions for optimal long-term stability.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to structure
Purity (HPLC)	≥ 98.0%
Assay	95.0 - 105.0%
Water Content (KF)	≤ 0.5%
Residue on Ignition	≤ 0.1%
Heavy Metals (as Pb)	≤ 10 ppm
Specific Impurities (HPLC)	Individual ≤ 0.5%, Total ≤ 1.0%

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.