Description

Triphenylsulfonium 10-Camphorsulfonate is a high-purity photoacid generator (PAG) salt, a critical component in advanced photoresist formulations. Its primary value lies in generating a strong acid upon exposure to deep ultraviolet (DUV) or electron beam (e-beam) radiation, initiating the chemical amplification process essential for high-resolution patterning. This compound is indispensable for manufacturers and R&D teams in the semiconductor, microelectronics, and advanced lithography industries, enabling the production of smaller, more powerful integrated circuits.

Application

• Chemical Amplification Resist (CAR) Formulations: A key photoacid generator for DUV (248nm, 193nm) and e-beam lithography photoresists.
• Semiconductor Manufacturing: Used in the fabrication of microprocessors, memory chips, and other integrated circuits requiring sub-micron feature sizes.
• Advanced Packaging: Applied in fan-out wafer-level packaging (FOWLP) and through-silicon via (TSV) processes.
• Micro-Electro-Mechanical Systems (MEMS): Enables precise patterning for sensors, actuators, and microfluidic devices.
• Optical Component Fabrication: Used in creating diffraction gratings, waveguides, and other micro-optical elements.
• Photopolymerization Initiator: Serves as a cationic photoinitiator for specialized UV-curing applications in coatings and adhesives.
• Research & Development: A crucial reagent for academic and industrial labs developing next-generation lithographic materials and processes.

Basic Information

Product Name	Triphenylsulfonium 10-Camphorsulfonate
CAS No.	227199-92-0
Molecular Formula	C31H32O4S2
Molecular Weight	532.71 g/mol
Synonyms	Triphenylsulfonium camphorsulfonate; (10-Camphorsulfonyloxy)triphenylsulfonium; Triphenylsulfonium (+)-10-camphorsulfonate; TPS-CSA; TPS-10-CSA; Photoacid Generator PAG 203; CG PAG 203; PAG 203; Triphenylsulfonium (1S)-(+)-10-camphorsulfonate
EINECS	Contact for details

Quality Control

Our Triphenylsulfonium 10-Camphorsulfonate is manufactured under strict quality management systems to ensure batch-to-batch consistency and high performance in critical lithographic applications. Each lot undergoes comprehensive analytical testing, including HPLC for purity and assay, NMR for structural confirmation, and Karl Fischer titration for moisture content. Certificates of Analysis (COA) with full traceability are provided with every shipment.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at 15-25°C. This product is hygroscopic (moisture-sensitive) and should be handled in a dry environment to prevent degradation. For long-term storage, consider storing under an inert atmosphere such as nitrogen or argon.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to structure
Assay (HPLC)	≥ 99.0%
Purity (HPLC, Area %)	≥ 99.5%
Water Content (KF)	≤ 0.5%
Residue on Ignition	≤ 0.1%
Heavy Metals (as Pb)	≤ 10 ppm
Specific Rotation [α]D20	+20° to +24° (c=1 in CHCl3)

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.