Description

Hafnium (IV) I-Propoxide Monoisopropylate is a high-purity metal-organic compound, also known as Hafnium isopropoxide, primarily used as a precursor in advanced materials synthesis. This compound is critical for depositing hafnium oxide (HfO₂) thin films, which are essential for high-k dielectric applications in next-generation semiconductor devices. It is a key material for manufacturers and R&D facilities in the electronics, nanotechnology, and specialty ceramics industries seeking precise and reliable precursors for atomic layer deposition (ALD) and chemical vapor deposition (CVD) processes.

Application

• Semiconductor Fabrication: As a precursor for the deposition of high-k hafnium oxide (HfO₂) dielectric layers in advanced CMOS transistors and memory devices via ALD and MOCVD.
• Optical & Ceramic Coatings: Used to create thin films for optical applications, protective coatings, and high-performance ceramic components requiring hafnium-based materials.
• Nanomaterials Research: Serves as a starting material for the synthesis of hafnium-containing nanoparticles, nanowires, and other nanostructured materials.
• Catalysis: Acts as a catalyst or catalyst precursor in specialized organic synthesis and polymerization reactions.
• Specialty Glass & Ceramics: Employed as a doping agent or additive to modify the refractive index, thermal stability, and mechanical properties of glasses and advanced ceramics.

Basic Information

Product Name	Hafnium (IV) I-Propoxide Monoisopropylate
CAS No.	2171-99-5
Molecular Formula	C12H28HfO4
Molecular Weight	418.94 g/mol
Synonyms	Hafnium isopropoxide; Hafnium(4+) tetraisopropoxide; Tetraisopropoxyhafnium; Hafnium tetra-isopropoxide; Hf(O-i-Pr)4; Hafnium(IV) isopropoxide; Hf(OCH(CH3)2)4; Monoisopropyl hafnium isopropoxide
EINECS	218-524-6

Quality Control

Our Hafnium (IV) I-Propoxide Monoisopropylate is manufactured under stringent conditions to ensure high purity and batch-to-batch consistency, suitable for demanding electronic applications. Quality is verified through a comprehensive suite of analytical techniques including NMR, ICP-MS, and Karl Fischer titration. A Certificate of Analysis (COA) detailing purity, metal content, and impurity profiles is provided with each shipment to guarantee compliance with your technical specifications.

Storage

Preserve in a tightly closed container, protected from light. Store under an inert atmosphere (argon or nitrogen) in a cool, dry, and well-ventilated area at room temperature (15-25°C). This material is hygroscopic (moisture-sensitive) and easily oxidized; containers must be kept sealed and purged with inert gas after each use to maintain product integrity.

Specification

Item	Specification
Appearance	Colorless to pale yellow liquid
Assay (Hf content)	≥ 99.9% (metals basis)
Purity (by NMR)	≥ 99.5%
Density (at 20°C)	~1.4 g/cm³
Water Content (Karl Fischer)	< 0.1%
Trace Metals (ICP-MS)	< 100 ppm total

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.