Description

Dimethyl-2,4-Dihydroxyphenylsulfonium Chloride is a specialized organosulfur compound, a sulfonium salt, that serves as a critical intermediate and reagent in advanced organic synthesis. Its unique structure, featuring both phenolic hydroxyl groups and a positively charged sulfur center, makes it a valuable precursor for photoacid generators (PAGs) and other functional materials. This high-purity chemical is essential for manufacturers and R&D laboratories in the electronics, polymer, and fine chemical sectors seeking to develop next-generation photoresists, cationic initiators, and specialty monomers.

Application

• Photoacid Generator (PAG) for Advanced Photoresists: A key component in chemically amplified resists (CAR) used in semiconductor manufacturing for deep-UV (DUV) and extreme-UV (EUV) lithography processes.
• Cationic Photoinitiator: Used to initiate the polymerization of epoxy resins, vinyl ethers, and other monomers in UV-curable coatings, inks, and adhesives.
• Organic Synthesis Intermediate: Acts as a versatile building block for synthesizing more complex sulfonium salts, sulfur-containing ligands, and functionalized phenolic compounds.
• Surface Modification Agent: Employed to modify material surfaces to alter wettability, adhesion, or introduce specific functional groups.
• Research & Development: Utilized in academic and industrial R&D for studying reaction mechanisms involving sulfonium ions and developing new catalytic or photochemical systems.

Basic Information

Product Name	Dimethyl-2,4-Dihydroxyphenylsulfonium Chloride
CAS No.	193684-62-7
Molecular Formula	C8H11ClO2S
Molecular Weight	206.69 g/mol
Synonyms	2,4-Dihydroxyphenyldimethylsulfonium Chloride; Dimethyl(2,4-dihydroxyphenyl)sulfonium Chloride; (2,4-Dihydroxyphenyl)dimethylsulfonium Chloride; Sulfonium, dimethyl(2,4-dihydroxyphenyl)-, chloride; Photoacid Generator PAG Precursor
EINECS	Contact for details

Quality Control

Every batch of Dimethyl-2,4-Dihydroxyphenylsulfonium Chloride is manufactured under strict quality management protocols. We employ advanced analytical techniques including HPLC, NMR, and mass spectrometry to ensure identity, purity, and consistency meet the exacting standards required for electronic and photochemical applications. A comprehensive Certificate of Analysis (COA) detailing purity, assay, and impurity profiles is provided with each shipment to guarantee traceability and support your quality assurance processes.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated place at room temperature (15-25°C). This compound is hygroscopic (moisture-sensitive) and light-sensitive; prolonged exposure to air, moisture, or light should be avoided to maintain stability and purity. Keep away from incompatible materials.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to structure
Assay (HPLC)	≥ 98.0%
Melting Point	Contact for details
Loss on Drying	≤ 1.0%
Heavy Metals	≤ 10 ppm
Residue on Ignition	≤ 0.1%

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.