Description

(tert-Butoxycarbonylmethoxyphenyl)Diphenylsulfonium Triflate is a specialized photoacid generator (PAG) used in advanced photoresist formulations. This compound is critical for enabling high-resolution patterning in the manufacturing of semiconductors and microelectronic devices. It is primarily needed by manufacturers in the electronics, semiconductor, and advanced materials industries for deep-UV (DUV) and other photolithographic processes.

Application

• Deep-UV (DUV) Photolithography: A key component in chemically amplified resists (CARs) for semiconductor fabrication.
• Advanced Photoresist Formulations: Used in the development of high-performance resists for next-generation integrated circuits (ICs).
• Microelectronics Manufacturing: Enables precise patterning for microprocessors, memory chips, and other electronic components.
• Photoacid Generation: Serves as a source of acid upon exposure to light, catalyzing the solubility switch in the resist polymer.
• Fine Chemical Synthesis: Can be utilized as a reagent in specialized organic synthesis requiring sulfonium salts.
• Research & Development: Employed in academic and industrial R&D for developing new photopolymerization and imaging technologies.

Basic Information

Product Name	(tert-Butoxycarbonylmethoxyphenyl)Diphenylsulfonium Triflate
CAS No.	180801-55-2
Molecular Formula	C27H25F3O5S2
Molecular Weight	550.61 g/mol
Synonyms	Boc-Methoxyphenyldiphenylsulfonium Triflate; (tert-Butoxycarbonylmethoxyphenyl)diphenylsulfonium Trifluoromethanesulfonate; (Boc-Protected Methoxyphenyl)Diphenylsulfonium Triflate; Sulfonium, (4-[[(1,1-dimethylethoxy)carbonyl]methoxy]phenyl)diphenyl-, trifluoromethanesulfonate (1:1); Photoacid Generator PAG; Sulfonium Salt Photoinitiator; Triphenylsulfonium derivative; CAS 180801-55-2
EINECS	Contact for details

Quality Control

Our (tert-Butoxycarbonylmethoxyphenyl)Diphenylsulfonium Triflate is produced under strict quality management systems to ensure batch-to-batch consistency and high purity suitable for demanding photolithographic applications. Each lot is analyzed with advanced techniques including HPLC and NMR to confirm identity and purity. Certificates of Analysis (COA) are provided with every shipment, detailing all relevant specifications.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at a controlled room temperature (15-25°C). This material is hygroscopic (moisture-sensitive) and light-sensitive; therefore, containers must be kept sealed under an inert atmosphere (e.g., nitrogen or argon) when not in use to prevent degradation. Keep away from incompatible materials.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to structure
Purity (HPLC)	≥ 98.0%
Water Content (KF)	≤ 0.5%
Residue on Ignition	≤ 0.1%
Heavy Metals (as Pb)	≤ 10 ppm

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.