Description

Dimethyl-2,4-Dihydroxyphenylsulfonium Triflate is a specialized photoacid generator (PAG) salt, a critical component in advanced photoresist formulations for high-resolution lithography. Its core value lies in its ability to generate a strong acid upon exposure to light, initiating precise chemical amplification patterns essential for manufacturing microelectronic devices. This compound is primarily needed by R&D chemists and production engineers in the semiconductor, electronics, and advanced materials industries for developing next-generation photoresists.

Application

• Semiconductor Photolithography: A key photoacid generator (PAG) in chemically amplified resists (CARs) for deep ultraviolet (DUV) and extreme ultraviolet (EUV) lithography processes.
• Advanced Electronics Manufacturing: Used in the production of printed circuit boards (PCBs), flat panel displays, and other microelectronic components requiring high-precision patterning.
• Polymer & Material Science: Serves as a cationic photoinitiator for the UV-curing of epoxy resins, coatings, and adhesives, enabling rapid polymerization.
• Research & Development: A valuable reagent for academic and industrial labs studying novel photochemical reactions, acid-catalyzed processes, and new photoresist chemistries.
• Optical Materials: Potential application in the fabrication of photonic crystals, waveguides, and other light-sensitive optical devices.

Basic Information

Product Name	Dimethyl-2,4-Dihydroxyphenylsulfonium Triflate
CAS No.	180787-54-6
Molecular Formula	C10H13F3O5S2
Molecular Weight	334.33 g/mol
Synonyms	Dimethyl(2,4-dihydroxyphenyl)sulfonium Trifluoromethanesulfonate; (2,4-Dihydroxyphenyl)dimethylsulfonium Triflate; Photoacid Generator PAG; Sulfonium Salt PAG; Dihydroxyphenylsulfonium Triflate; DMHPST; PAG 1 (trade name variant); Dimethyl(2,4-dihydroxyphenyl)sulfonium Triflate
EINECS	Contact for details

Quality Control

Our Dimethyl-2,4-Dihydroxyphenylsulfonium Triflate is manufactured under strict quality management systems. Each batch undergoes rigorous analytical testing, including HPLC for purity, NMR for structural confirmation, and Karl Fischer titration for moisture content, to ensure it meets the stringent requirements of photoresist applications. Certificates of Analysis (COA) with detailed specifications are provided for every shipment to guarantee traceability and consistency for your critical processes.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at 15-25°C. This material is hygroscopic (moisture-sensitive) and light-sensitive; therefore, containers must be kept tightly sealed in a desiccated environment and handled under appropriate light conditions (e.g., yellow light) to prevent decomposition. Keep away from strong bases and oxidizing agents.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to structure
Purity (HPLC)	≥ 98.0%
Melting Point	Contact for details
Water Content (KF)	≤ 0.5%
Heavy Metals	≤ 10 ppm
Residual Solvents (GC)	Meets ICH guidelines

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.