Description

Carbonic Acid 1,1-Dimethylethyl 4-Ethenylphenyl Ester Polymer With 1-Ethenyl-4-(1-Ethoxyethoxy)Benzene And 4-Ethenylphenyl CAS NO 177034-75-2 is a specialized high-performance polymer designed for advanced material science applications. This compound is valued for its unique structural properties, offering excellent thermal stability and chemical resistance for demanding industrial environments. It is primarily utilized by manufacturers in the electronics, specialty coatings, and advanced polymer composite sectors seeking to enhance material performance.

Application

• Photoresist Polymers: A key monomer or polymer component in advanced photoresists for semiconductor and microelectronics fabrication.
• Specialty Coatings: Used in formulating high-performance protective and functional coatings requiring enhanced durability and chemical resistance.
• Advanced Polymer Composites: Serves as a building block or modifier in engineering plastics and composite materials to improve thermal and mechanical properties.
• Optical Materials: Potential application in the synthesis of polymers for optical films, lenses, or waveguides due to its specific aromatic structure.
• Adhesive & Sealant Formulations: Incorporated into high-specification adhesives and sealants where stability under harsh conditions is critical.
• Lithographic Printing Plates: Can be used in the production of chemical components for next-generation printing plates.

Basic Information

Item	Details
Product Name	Carbonic Acid 1,1-Dimethylethyl 4-Ethenylphenyl Ester Polymer With 1-Ethenyl-4-(1-Ethoxyethoxy)Benzene And 4-Ethenylphenyl
CAS No.	177034-75-2
Molecular Formula	Contact for details
Molecular Weight	Contact for details
Synonyms	Poly(4-tert-butoxycarbonyloxystyrene-co-4-(1-ethoxyethoxy)styrene); TBOC-ST/EEST Copolymer; 4-(tert-Butoxycarbonyloxy)styrene - 4-(1-Ethoxyethoxy)styrene copolymer; p-(tert-Butoxycarbonyloxy)styrene and p-(1-Ethoxyethoxy)styrene polymer; Photoresist polymer; BOC-ST/EEST resin; CAS 177034-75-2 polymer; Acid-sensitive polymer for lithography
EINECS	Contact for details

Quality Control

Our production of this advanced polymer adheres to strict quality management systems, ensuring batch-to-batch consistency and reliability. Each lot is characterized using advanced analytical techniques such as GPC, NMR, and HPLC to confirm molecular weight distribution, composition, and purity. A comprehensive Certificate of Analysis (COA) detailing all specifications is provided with every shipment to support your quality assurance protocols.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated area at a controlled room temperature (typically 15-25°C). This material is light-sensitive (store away from light) and may be hygroscopic (moisture-sensitive); ensure containers are sealed after use to minimize exposure to atmospheric moisture.

Specification

Item	Specification
Appearance	White to off-white powder or solid
Identification (IR)	Conforms to structure
Assay (Monomer Composition)	By NMR
Molecular Weight (Mw)	Specified range (GPC)
Polydispersity Index (PDI)	≤ Specified value
Residual Solvents	Meets ICH guidelines
Loss on Drying	≤ 1.0%

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.