Description

Bis[4-(Diphenylsulfonio)Phenyl]Sulfide Bis(Hexafluoroantimonate) Mixture With Diphenyl[4-(Phenylthio)Phenyl]Sulfonium Hexafluoroantimonate is a high-performance, dual-component photoacid generator (PAG) critical for advanced photolithography processes. This specialized mixture is engineered to deliver superior photosensitivity and thermal stability, enabling the precise patterning required for next-generation microelectronics. It is an essential material for manufacturers of semiconductors, integrated circuits, and other high-resolution photoresist formulations where control over acid generation and diffusion is paramount.

Application

• Advanced Photoresist Formulations: A key component in chemically amplified resists (CARs) for deep-UV (DUV), KrF, and ArF lithography in semiconductor fabrication.
• Microelectronics Manufacturing: Used in the production of integrated circuits (ICs), microprocessors, and memory chips requiring sub-micron feature sizes.
• Photoinitiator Systems: Functions as an efficient cationic photoinitiator for the UV-curing of epoxy resins and other polymerizable systems.
• High-Resolution Imaging: Enables precise patterning in optical and electronic applications, including flat panel displays and MEMS devices.
• Specialty Polymer Synthesis: Catalyzes photo-induced cationic polymerization reactions for creating specialized polymeric materials.
• Research & Development: Serves as a critical reagent in academic and industrial R&D for developing new photoresist technologies and lithographic processes.

Basic Information

Product Name	Bis[4-(Diphenylsulfonio)Phenyl]Sulfide Bis(Hexafluoroantimonate) Mixture With Diphenyl[4-(Phenylthio)Phenyl]Sulfonium Hexafluoroantimonate
CAS No.	159120-95-3
Molecular Formula	Contact for details
Molecular Weight	Contact for details
Synonyms	Dual Sulfonium Salt Photoacid Generator; Mixed Sulfonium Hexafluoroantimonate PAG; Bis(4-(diphenylsulfonio)phenyl) sulfide bis(hexafluoroantimonate) mixture with diphenyl(4-(phenylthio)phenyl)sulfonium hexafluoroantimonate; Photoacid Generator 159120-95-3; Sulfonium Salt PAG Mixture; Antimony Hexafluoride Sulfonium Salt Complex; Lithography Photoacid Generator; Cationic Photoinitiator Mixture
EINECS	Contact for details

Quality Control

Every batch of our photoacid generator mixture is manufactured and tested under strict quality management protocols to ensure consistency and performance for critical lithography applications. We employ advanced analytical techniques, including HPLC, NMR, and ICP-MS, to verify chemical identity, purity, and control metallic impurities. A comprehensive Certificate of Analysis (COA) detailing lot-specific results is provided with each shipment to support your quality assurance and regulatory needs.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at a controlled room temperature (15-25°C). This product is hygroscopic (moisture-sensitive) and must be kept under anhydrous conditions, preferably in a desiccator or under an inert atmosphere to prevent decomposition and maintain efficacy. Keep away from incompatible materials.

Specification

Item	Specification
Appearance	White to off-white crystalline powder or solid
Identification (IR)	Conforms to reference spectrum
Purity (HPLC)	≥ 98.0% (Total active components)
Component Ratio	Specified on COA
Water Content (KF)	≤ 0.5%
Residue on Ignition	≤ 0.1%
Heavy Metals (as Pb)	≤ 10 ppm
Specific Metals (ICP-MS)	Na, K, Ca, Fe, each ≤ 5 ppm

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.