Description

Tri(Chloro)Di(Pyridyl)(Tertbutylimido)Tantalum is a high-purity organometallic compound of tantalum, specifically designed for advanced materials synthesis. This compound matters as a critical precursor for depositing high-performance tantalum-based thin films, which are essential for next-generation semiconductor devices and protective coatings. It is primarily needed by manufacturers in the electronics, optical coating, and specialty catalyst industries for applications requiring precise atomic-level control. The CAS number for this material is 157464-07-8.

Application

• Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD): As a key precursor for depositing tantalum nitride (TaN), tantalum carbide (TaC), and pure tantalum thin films as diffusion barriers and gate electrodes in semiconductor fabrication.
• Advanced Surface Coatings: For creating wear-resistant, corrosion-resistant, and high-temperature protective coatings on industrial components and cutting tools.
• Specialty Catalysis: Serving as a catalyst or catalyst precursor in specialized organic synthesis and polymerization reactions, leveraging its unique imido and pyridyl ligands.
• Materials Research & Development: For the synthesis of novel metal-organic frameworks (MOFs), coordination polymers, and other advanced inorganic-organic hybrid materials.
• Optical and Electronic Thin Films: Used in the production of thin films for optical devices, sensors, and memory technology applications.

Basic Information

Item	Details
Product Name	Tri(Chloro)Di(Pyridyl)(Tertbutylimido)Tantalum
CAS No.	157464-07-8
Molecular Formula	C14H17Cl3N3Ta
Molecular Weight	528.53 g/mol
Synonyms	Tris(chloro)bis(pyridine)(tert-butylimido)tantalum(V); (tert-Butylimido)tris(chloro)bis(pyridine)tantalum(V); TaCl3(NtBu)(py)2; Tantalum(V) tert-butylimide trichloride bis(pyridine) adduct; Tertbutylimidotrichlorobis(pyridine)tantalum; TBTIPT; Tantalum CVD/ALD Precursor
EINECS	Contact for details

Quality Control

Our Tri(Chloro)Di(Pyridyl)(Tertbutylimido)Tantalum is manufactured under stringent conditions to ensure batch-to-batch consistency and high purity, meeting the exacting requirements of electronic materials production. We adhere to a rigorous quality management system, and each lot is accompanied by a comprehensive Certificate of Analysis (COA) detailing purity, identity, and impurity profiles. Specifications are designed to align with the needs of the semiconductor and advanced materials industries.

Storage

Preserve in a tightly closed container, protected from light. This material is hygroscopic (moisture-sensitive) and light-sensitive. For long-term stability, store under an inert atmosphere (argon or nitrogen) in a cool, dry place, ideally at temperatures between 2°C and 8°C. Allow the container to reach room temperature before opening to minimize moisture ingress.

Specification

Item	Specification
Appearance	Yellow to orange crystalline solid
Identification (IR)	Conforms to structure
Assay (Tantalum content)	≥ 99.9% (metals basis)
Purity (HPLC)	≥ 99.0%
Chloride Content	Theoretical
Pyridine Content	Theoretical
Trace Metals (ICP-MS)	< 100 ppm total

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.