Description

Tris(2,2,6,6-Tetramethyl-3,5-Heptane-Dionato)Lanthanum Tetraglyme Adduct is a highly specialized organolanthanum complex where the lanthanum ion is chelated by three bulky dipivaloylmethanate ligands and coordinated by a tetraglyme solvent molecule. This compound matters as a high-purity, volatile precursor essential for advanced material synthesis, offering superior control over stoichiometry and film properties. It is critically needed by manufacturers and R&D teams in the semiconductor, thin-film deposition (ALD/CVD), and specialty catalyst industries.

Application

• Chemical Vapor Deposition (CVD) & Atomic Layer Deposition (ALD): As a volatile precursor for depositing high-k lanthanum oxide (La₂O₃) dielectric films in next-generation semiconductor devices.
• Thin-Film Electronics: For the fabrication of gate dielectrics in transistors and memory elements, leveraging its precise stoichiometric delivery.
• Specialty Catalysis: Serving as a well-defined single-source precursor or catalyst in organic synthesis and polymerization reactions.
• Phosphor & Luminescent Materials: As a starting material for synthesizing doped lanthanum-based phosphors used in displays and lighting.
• Research & Development: For academic and industrial research into novel lanthanum-containing materials, complexes, and nanomaterials.
• Advanced Ceramics: In the sol-gel or precursor synthesis of high-performance lanthanum ceramic powders for sensors and electrolytes.

Basic Information

Product Name	Tris(2,2,6,6-Tetramethyl-3,5-Heptane-Dionato)Lanthanum Tetraglyme Adduct
CAS No.	151139-14-9
Molecular Formula	C₄₃H₈₁LaO₁₁
Molecular Weight	933.03 g/mol
Synonyms	Lanthanum(III) tris(dipivaloylmethanate) tetraglyme adduct; La(dpm)₃·tetraglyme; Tris(dipivaloylmethanato)lanthanum tetraglyme adduct; Lanthanum tris(2,2,6,6-tetramethyl-3,5-heptanedionate) tetraglyme adduct; La(TMHD)₃·tetraglyme; La(thd)₃·tetraglyme; Lanthanum β-diketonate complex; Volatile Lanthanum Precursor
EINECS	Contact for details

Quality Control

Our high-purity organometallic precursors are manufactured and handled under stringent conditions to ensure batch-to-batch consistency and reliability for critical applications. Each lot undergoes rigorous analytical testing, including NMR, elemental analysis (C/H), and ICP-MS for metal purity and trace impurity profiling. A comprehensive Certificate of Analysis (COA) detailing purity, identity, and specific test results is provided with every shipment to support your quality assurance protocols.

Storage

Preserve in a tightly closed container, protected from light. Store under an inert atmosphere (argon or nitrogen) in a cool, dry place at 2-8°C to minimize decomposition and maintain stability. This compound is hygroscopic (moisture-sensitive) and easily oxidized; prolonged exposure to air, moisture, or elevated temperatures should be avoided.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to structure
Assay (La content)	≥ 14.8% (by ICP-OES)
Purity (by NMR)	≥ 99.0%
Trace Metals (ICP-MS)	≤ 100 ppm total
Solubility	Soluble in common organic solvents

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.