Description

Copper I Hexafluoropentanedionate-2-Butyne Complex is a high-purity, volatile organometallic compound used as a precursor in advanced material synthesis. This complex is valued for its role in depositing high-quality copper-containing thin films with excellent uniformity and electrical properties. It is a critical material for manufacturers in the semiconductor, photovoltaic, and specialty glass coating industries seeking precise and reliable chemical vapor deposition (CVD) or atomic layer deposition (ALD) processes.

Application

• Semiconductor Manufacturing: As a copper precursor for CVD and ALD processes to create conductive interconnects, seed layers, and diffusion barriers in integrated circuits.
• Photovoltaics & Solar Cells: For depositing transparent conductive oxide (TCO) layers and copper-based absorber layers to enhance cell efficiency.
• Optical & Functional Coatings: Used in the production of anti-reflective, electrochromic, or electrically conductive coatings on glass and other substrates.
• Nanomaterial Synthesis: Serves as a source material for the controlled synthesis of copper nanoparticles and nanowires with specific catalytic or electronic properties.
• Research & Development: A key reagent in academic and industrial R&D for exploring new copper-based materials, catalysts, and deposition techniques.

Basic Information

Product Name	Copper I Hexafluoropentanedionate-2-Butyne Complex
CAS No.	137007-13-7
Molecular Formula	C13H9CuF6O4
Molecular Weight	407.75 g/mol
Synonyms	Copper(I) hexafluoroacetylacetonate 2-butyne adduct; (1,1,1,5,5,5-Hexafluoro-2,4-pentanedionato)(2-butyne)copper(I); Cu(I)(hfac)(2-butyne); Copper(I) hfac 2-butyne; Volatile Copper(I) Complex; CVD Copper Precursor; ALD Copper Source; Copper 1,1,1,5,5,5-hexafluoro-2,4-pentanedionate 2-butyne adduct
EINECS	Contact for details

Quality Control

Our Copper I Hexafluoropentanedionate-2-Butyne Complex is produced and handled under strict quality management systems to ensure batch-to-batch consistency and high purity, essential for sensitive deposition processes. Each lot is analyzed to confirm identity, purity, and absence of critical metallic impurities. A comprehensive Certificate of Analysis (COA) detailing specifications and test results is provided with every shipment.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated place at room temperature (15-25°C). This compound is moisture-sensitive (hygroscopic) and should be handled under an inert atmosphere (e.g., nitrogen or argon) to prevent degradation. Keep away from strong acids and strong oxidizers.

Specification

Item	Specification
Appearance	White to off-white crystalline solid or powder
Identification (IR)	Conforms to reference spectrum
Assay (Cu content)	≥ 99.0% (by ICP-OES or Titration)
Purity (HPLC/GC)	≥ 99.5%
Melting Point	Contact for details
Volatile Impurities (GC)	≤ 0.5%
Metallic Impurities (ICP-MS)	Each ≤ 10 ppm

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.