Description

Tri-p-Tolylsulfonium Triflate is a specialized photoacid generator (PAG) widely used in advanced photoresist formulations. This compound is valued for its high efficiency in generating strong acids upon exposure to UV or deep-UV light, which is critical for driving the chemical amplification process in photolithography. It is an essential material for manufacturers in the semiconductor and microelectronics industries, enabling the production of smaller, more precise circuit features. Its properties also make it suitable for use in other photo-curing applications within high-performance coatings and advanced material synthesis.

Application

• Semiconductor Photolithography: A key component in chemically amplified resists (CARs) for deep-UV (DUV) and extreme-UV (EUV) lithography processes.
• Microelectronics Fabrication: Used in the patterning of integrated circuits (ICs) and microelectromechanical systems (MEMS).
• Advanced Polymer Synthesis: Serves as a cationic photoinitiator for the polymerization of epoxides and other monomers in UV-curing systems.
• High-Performance Coatings: Enables the development of durable, photo-cured protective and functional coatings for optical and electronic components.
• Printing Plate Production: Utilized in the manufacture of high-resolution printing plates for the graphic arts industry.
• Optical Material Processing: Applied in the fabrication of waveguides, optical fibers, and other photonic devices.

Basic Information

Product Name	Tri-p-Tolylsulfonium Triflate
CAS No.	127820-38-6
Molecular Formula	C23H23F3O3S2
Molecular Weight	492.55 g/mol
Synonyms	Tris(4-methylphenyl)sulfonium Trifluoromethanesulfonate; Tris(p-tolyl)sulfonium Triflate; Tri(4-methylphenyl)sulfonium Triflate; Photoacid Generator PAG; Sulfonium Salt PAG; Trip-tolylsulfonium Trifluoromethanesulfonate; Tris(4-tolyl)sulfonium Triflate
EINECS	Contact for details

Quality Control

Our Tri-p-Tolylsulfonium Triflate is manufactured under strict quality management systems to ensure batch-to-batch consistency and high purity, essential for sensitive lithographic processes. Each lot is analyzed using advanced techniques including HPLC, NMR, and Karl Fischer titration. A comprehensive Certificate of Analysis (COA) detailing purity, identity, and impurity profiles is provided with every shipment to support your quality assurance protocols.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at a controlled room temperature (15-25°C). This material is hygroscopic (moisture-sensitive) and should be handled in a dry environment to prevent decomposition. Keep the container tightly sealed when not in use.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to structure
Assay (HPLC)	≥ 99.0%
Water Content (KF)	≤ 0.5%
Heavy Metals (as Pb)	≤ 10 ppm
Residual Solvents (GC)	Meets ICH guidelines

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.