Description

(4-Methoxyphenyl)Diphenylsulfonium Triflate is a high-purity photoacid generator (PAG) widely used in advanced photoresist formulations. This compound is critical for enabling high-resolution patterning in semiconductor and microelectronics manufacturing. It is primarily utilized by R&D chemists and production engineers in the photolithography, advanced packaging, and printed circuit board (PCB) industries to produce next-generation electronic devices.

Application

• Photolithography for Semiconductor Fabrication: A key component in chemically amplified resists (CARs) for deep ultraviolet (DUV) and extreme ultraviolet (EUV) lithography processes.
• Advanced Packaging & Interconnects: Used in the production of redistribution layers (RDLs) and through-silicon vias (TSVs) for 2.5D and 3D integrated circuits.
• Printed Circuit Board (PCB) Manufacturing: Employed in solder mask and dielectric layer patterning for high-density interconnect (HDI) boards.
• Micro-Electro-Mechanical Systems (MEMS): Facilitates the precise etching required in the creation of micro-sensors and actuators.
• Optical Component Fabrication: Used in the patterning of waveguides, gratings, and other micro-optical elements.
• Research & Development: Serves as a benchmark PAG in academic and industrial labs for developing new photoresist chemistries and processes.

Basic Information

Product Name	(4-Methoxyphenyl)Diphenylsulfonium Triflate
CAS No.	116808-67-4
Molecular Formula	C₂₀H₁₇F₃O₄S₂
Molecular Weight	454.47 g/mol
Synonyms	(p-Methoxyphenyl)diphenylsulfonium Trifluoromethanesulfonate; (4-Methoxyphenyl)diphenylsulfonium Trifluoromethanesulfonate; Diphenyl(4-methoxyphenyl)sulfonium Triflate; Photoacid Generator PAG 203; Sulfonium, (4-methoxyphenyl)diphenyl-, trifluoromethanesulfonate (1:1); (4-MPS)DPST; (p-Anisyl)diphenylsulfonium Triflate
EINECS	Contact for details

Quality Control

Our (4-Methoxyphenyl)Diphenylsulfonium Triflate is manufactured under strict quality management systems. Each batch undergoes comprehensive analytical testing, including HPLC, NMR, and Karl Fischer titration, to ensure high purity and consistent performance critical for photolithographic applications. Certificates of Analysis (COA) detailing lot-specific results are provided with every shipment.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at 15-25°C. This material is hygroscopic (moisture-sensitive) and should be handled in a dry, inert atmosphere or under anhydrous conditions to maintain efficacy. Keep container tightly sealed when not in use.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to structure
Assay (HPLC)	≥ 99.0%
Water Content (KF)	≤ 0.5%
Heavy Metals (as Pb)	≤ 10 ppm
Residue on Ignition	≤ 0.1%
Related Substances (HPLC)	Total impurities ≤ 1.0%

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.