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Vanadium Tetrakis(Dimethylamide) CAS NO 19824-56-7
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CAS No.:19824-56-7
Grade:Pharmacy Grade
Content:99.9%
Brand:Customizable
Packaging:Customizable
Description
Vanadium Tetrakis(Dimethylamide) is a highly reactive organovanadium compound primarily used as a precursor in advanced materials synthesis. This compound matters for its role in depositing high-purity vanadium-containing thin films via chemical vapor deposition (CVD) and atomic layer deposition (ALD) techniques. It is essential for manufacturers and R&D facilities in the semiconductor, catalysis, and specialty chemical industries seeking to develop next-generation electronic and catalytic materials.
Application
- Chemical Vapor Deposition (CVD) & Atomic Layer Deposition (ALD): A key precursor for depositing vanadium nitride (VN), vanadium oxide (V2O5, VO2), and other vanadium-based thin films on substrates.
- Semiconductor Manufacturing: Used in the fabrication of diffusion barriers, gate electrodes, and resistive switching layers in microelectronic devices.
- Catalyst Research & Development: Serves as a starting material for synthesizing homogeneous and heterogeneous catalysts for oxidation and polymerization reactions.
- Advanced Ceramics & Coatings: A precursor for producing wear-resistant, hard ceramic coatings and functional ceramic materials.
- Energy Storage Materials: Investigated for the synthesis of electrode materials for lithium-ion and other advanced battery systems.
- Organic Synthesis: Acts as a reagent or catalyst in specialized organic transformations and polymerizations.
Basic Information
| Product Name | Vanadium Tetrakis(Dimethylamide) |
| CAS No. | 19824-56-7 |
| Molecular Formula | C8H24N4V |
| Molecular Weight | 235.24 g/mol |
| Synonyms | Tetrakis(dimethylamido)vanadium(IV); Vanadium(IV) tetrakis(dimethylamide); Tetrakis(dimethylamino)vanadium(IV); Vanadium N,N-dimethylamide; V(NMe2)4; TDMAV; Vanadium Dimethylamide Complex |
| EINECS | Contact for details |
Quality Control
Our Vanadium Tetrakis(Dimethylamide) is produced and handled under stringent quality protocols to ensure batch-to-batch consistency and high purity, critical for sensitive deposition processes. Each lot is supported by a comprehensive Certificate of Analysis (COA) detailing key parameters such as purity, metal impurities, and solvent residues. We adhere to industry best practices and can provide material tailored to meet specific customer requirements for advanced applications.
Storage
Preserve in a tightly closed container, protected from light. Store under an inert atmosphere (argon or nitrogen) at room temperature (15-25°C) in a cool, dry, and well-ventilated place. This material is hygroscopic (moisture-sensitive) and easily oxidized; containers must be kept sealed and purged with inert gas after each use to maintain purity and prevent decomposition.
Specification
| Item | Specification |
|---|---|
| Appearance | Yellow to brown liquid or solid |
| Identification (IR) | Conforms |
| Purity (NMR/Titration) | ≥ 95.0% |
| Vanadium (V) Content | Contact for details |
| Trace Metals (ICP-MS) | ≤ 100 ppm total |
| Solvent Residue (GC) | Contact for details |
Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.
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