Description

Trichlorosilyl Radical CAS NO 19165-34-5 is a highly reactive silicon-centered radical species, serving as a critical intermediate in advanced chemical synthesis. Its primary value lies in enabling precise, radical-based functionalization of silicon and other substrates, which is essential for creating novel materials and fine chemicals. This compound is particularly needed by researchers and manufacturers in the semiconductor, specialty polymer, and organosilicon chemistry sectors for developing next-generation electronic materials and high-performance silicones.

Application

• Semiconductor Manufacturing: As a key precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes for depositing ultra-thin silicon-containing films.
• Surface Functionalization: For the radical-initiated modification of silicon wafers and other material surfaces to alter their electronic or chemical properties.
• Polymer & Material Science: Acting as a reactive intermediate in the synthesis of novel polysilanes, silsesquioxanes, and other advanced silicon-based polymers.
• Organic Synthesis: Utilized in radical chain reactions for the selective introduction of trichlorosilyl groups into organic molecules.
• Catalysis Research: As a model compound or co-catalyst in studies involving silicon-centered radical mechanisms.
• Photoresist & Lithography: Potential use in the development of advanced photoresist materials for micro- and nano-fabrication.

Basic Information

Product Name	Trichlorosilyl Radical
CAS No.	19165-34-5
Molecular Formula	Cl3Si•
Molecular Weight	168.45 g/mol
Synonyms	Trichlorosilyl; Trichlorosilyl radical; Silyl, trichloro-; Silicon trichloride radical; Chlorotrichlorosilyl; Trichlorosilylene (in some contexts); Radical SiCl3; Trichloromonosilyl radical
EINECS	Contact for details

Quality Control

Our Trichlorosilyl Radical is produced and handled under strictly controlled conditions to ensure batch-to-batch consistency and high reactivity. Each lot is characterized using advanced spectroscopic techniques to confirm its identity and radical purity. A comprehensive Certificate of Analysis (COA) detailing specific analytical results is provided with every shipment, ensuring full traceability and compliance with your research or production protocols.

Storage

Preserve in a tightly closed container, protected from light. Due to its highly volatile and easily oxidized nature, this material must be stored under an inert atmosphere (e.g., argon or nitrogen) at recommended temperatures between -20°C to -80°C for long-term stability. The container should be kept in a cool, dry, well-ventilated area away from incompatible materials.

Specification

Item	Specification
Appearance	Contact for details
Identification (EPR/ESR)	Conforms
Radical Concentration	Contact for details
Purity (by GC/MS)	Contact for details
Chlorosilane Impurities	Contact for details

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.