Description

Phosphine, Trisilyl- is a highly specialized organosilicon compound with the CAS registry number 15110-33-5. This chemical serves as a critical precursor in advanced materials science, valued for its unique silicon-phosphorus bonding structure. It is primarily utilized by researchers and manufacturers in the semiconductor and specialty chemical industries for applications such as chemical vapor deposition (CVD) and the synthesis of novel phosphorus-containing materials.

Application

• Semiconductor Manufacturing: As a key precursor for the chemical vapor deposition (CVD) or atomic layer deposition (ALD) of phosphorus-doped silicon-based thin films.
• Advanced Material Synthesis: For the development of novel phosphorus-silicon polymers, ceramics, and other hybrid materials with tailored electronic or thermal properties.
• Catalysis Research: Employed as a ligand or catalyst precursor in organometallic chemistry and homogeneous catalysis development.
• Phosphorus Chemistry: As a versatile building block for the synthesis of more complex organophosphorus compounds in research and development.
• Doping Agent: For the controlled introduction of phosphorus into silicon wafers or other semiconductor substrates.
• Specialty Chemical Intermediates: In the production of flame retardants, stabilizers, or other performance chemicals where a silicon-phosphorus linkage is required.

Basic Information

Product Name	Phosphine, Trisilyl-
CAS No.	15110-33-5
Molecular Formula	H9P Si3
Molecular Weight	124.27 g/mol
Synonyms	Trisilylphosphine; Silicon Phosphide (H9PSi3); Trisilyl phosphine; Phosphorous trisilicide hydride; Trisilanephosphine; P(SiH3)3; 1,3,5-Trisilaphosphinane (related cyclic form)
EINECS	Contact for details

Quality Control

Our Phosphine, Trisilyl- is produced and handled under stringent quality protocols to ensure batch-to-batch consistency and high purity, essential for sensitive applications like semiconductor fabrication. Each lot is accompanied by a comprehensive Certificate of Analysis (COA) detailing purity, identity, and impurity profiles. We adhere to relevant industry standards and our quality management system is designed to meet the exacting requirements of advanced material supply chains.

Storage

Preserve in a tightly closed container, protected from light. Due to its highly volatile and easily oxidized nature (store under inert atmosphere), this material must be stored under a dry, inert gas (e.g., argon or nitrogen) in a cool, well-ventilated area. Recommended storage temperature is between 2°C and 8°C to minimize decomposition and maintain stability. Keep away from heat, sparks, open flames, and oxidizing agents.

Specification

Item	Specification
Appearance	Colorless to pale yellow liquid / gas
Identification (IR)	Conforms to structure
Purity (GC or NMR)	≥ 95.0%
Silicon Content	Contact for details
Phosphorus Content	Contact for details
Volatile Impurities	Contact for details

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.