Description

1-Fluorodisilane is a specialized organosilicon compound featuring a silicon-silicon bond with a fluorine substituent, serving as a critical precursor in advanced material synthesis. Its primary value lies in its ability to introduce both silicon and fluorine functionalities in a single step, enabling precise control over material properties in high-tech manufacturing. This compound is essential for researchers and production engineers in the semiconductor, photovoltaic, and specialty chemical industries who require high-purity intermediates for thin-film deposition and surface functionalization.

Application

• Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD): As a key silicon and fluorine source for depositing silicon-containing thin films, silicon carbide (SiC), or doped silicon layers on semiconductor wafers.
• Plasma-Enhanced CVD (PECVD): Used in the fabrication of photovoltaic cells and microelectronic devices to create passivation layers or gate dielectrics.
• Synthesis of Fluorinated Silanes and Siloxanes: Acts as a building block for creating novel fluorinated silicone polymers, resins, and surface treatment agents with enhanced thermal stability and hydrophobicity.
• Surface Modification and Functionalization: Employed to graft fluorosilane monolayers onto glass, metal, or silicon surfaces, imparting specific chemical, electronic, or release properties.
• Research & Development in Organosilicon Chemistry: A valuable reagent for exploring new reaction pathways and synthesizing novel disilane derivatives and silicon cluster compounds.
• Specialty Gas Mixtures: Formulated into specialized gas blends for etching or doping processes in semiconductor fabrication facilities (fabs).

Basic Information

Product Name	1-Fluorodisilane
CAS No.	14537-73-6
Molecular Formula	Si2H5F
Molecular Weight	80.21 g/mol
Synonyms	Disilanyl fluoride; Fluorodisilane; Disilane, 1-fluoro-; Silicon fluoride hydride (Si2H5F); H3Si-SiH2F; 1-Fluoro-disilane; Fluorinated disilane; Hexahydro-1-fluorodisilane
EINECS	Contact for details

Quality Control

Our 1-Fluorodisilane is produced and handled under stringent quality management protocols to ensure batch-to-batch consistency and high purity, critical for sensitive electronic applications. Each lot is analyzed using advanced techniques including Gas Chromatography (GC) and Mass Spectrometry (GC-MS) to verify identity and quantify impurities. A comprehensive Certificate of Analysis (COA) detailing purity, impurity profile, and moisture content is provided with every shipment to support your quality assurance and process validation requirements.

Storage

Preserve in a tightly closed, properly rated cylinder or container, protected from light. Store in a cool, well-ventilated area away from heat, ignition sources, and incompatible materials. Due to its highly volatile and gaseous nature, the container must be kept securely sealed and upright. Store under an inert atmosphere (e.g., nitrogen or argon) if the container is opened and resealed. Recommended storage temperature is between 15°C and 25°C.

Specification

Item	Specification
Appearance	Colorless gas
Identification (IR)	Conforms
Purity (GC)	≥ 98.0%
Major Impurities (GC-MS)	Disilane, Higher silanes
Moisture (Karl Fischer)	≤ 50 ppm
Oxygen	≤ 10 ppm
Non-condensable gases	≤ 0.5%

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.