Description

Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)aluminum is a highly specialized organometallic compound, specifically an aluminum(III) β-diketonate complex. This material is valued for its role as a volatile precursor in advanced material synthesis, offering excellent thermal stability and vapor pressure characteristics. It is primarily utilized by manufacturers and researchers in the semiconductor, OLED, and specialty chemical industries for applications such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) to create high-purity aluminum oxide films.

Application

• Precursor for Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) processes.
• Source material for depositing high-purity aluminum oxide (Al2O3) thin films in semiconductor manufacturing.
• Used in the production of protective coatings, dielectric layers, and optical coatings.
• Key material in the fabrication of OLED (Organic Light-Emitting Diode) devices and micro-electromechanical systems (MEMS).
• Catalyst or catalyst precursor in specialized organic synthesis and polymerization reactions.
• Starting material for the synthesis of other aluminum-containing complexes and nanomaterials.

Basic Information

Product Name	Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)aluminum
CAS No.	14319-08-5
Molecular Formula	Al(C11H19O2)3 / C33H57AlO6
Molecular Weight	576.78 g/mol
Synonyms	Aluminum tris(2,2,6,6-tetramethyl-3,5-heptanedionate); Aluminum(III) acetylacetonate, tetramethyl-; Al(TMHD)3; Al(thd)3; Tris(2,2,6,6-tetramethylheptane-3,5-dionato)aluminum; Tris(tetramethylheptanedionato)aluminum; Aluminum tri(2,2,6,6-tetramethyl-3,5-heptanedionate); ALD/CVD Precursor AL-01
EINECS	Contact for details

Quality Control

Our Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)aluminum is produced under controlled conditions to ensure high purity and batch-to-batch consistency suitable for sensitive deposition processes. Quality is verified through a suite of analytical techniques including NMR, FT-IR, and elemental analysis. A Certificate of Analysis (COA) detailing purity, metal content, and trace impurity levels is provided with each shipment. We support compliance with relevant industry standards for electronic-grade materials.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated place at room temperature (15-25°C). This compound is hygroscopic (moisture-sensitive); containers must be kept tightly sealed under an inert atmosphere (e.g., nitrogen or argon) after opening to prevent degradation. Keep away from incompatible materials such as strong oxidizers.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to structure
Purity (HPLC)	≥ 99.0%
Aluminum (Al) Content	4.6 - 4.8 %
Melting Point	194 - 198 °C
Volatile Matter	≤ 0.5 %
Trace Metals (ICP-MS)	≤ 10 ppm each

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.