Description

Tantalum Hydride is an inorganic compound of significant industrial interest, primarily utilized as a hydrogen storage material and a precursor in advanced metallurgy. Its ability to absorb and release hydrogen makes it a critical component in specialized energy and materials science applications. This high-purity material is essential for researchers and manufacturers in sectors such as aerospace, semiconductor fabrication, and hydrogen technology development.

Application

• Hydrogen Storage Medium: Utilized in solid-state hydrogen storage systems for its high volumetric density and reversible absorption/desorption properties.
• Gettering Agent: Acts as a getter in high-vacuum systems and electronic components to absorb residual gases, ensuring long-term stability and performance.
• Metallurgical Precursor: Serves as a starting material for the production of tantalum metal and tantalum-based alloys via thermal decomposition.
• Catalysis Research: Investigated as a catalyst or catalyst support in hydrogenation and dehydrogenation reactions within chemical research.
• Semiconductor Industry: Used in specialized thin-film deposition processes and as a barrier layer material in advanced microelectronics.
• Neutron Moderation: Employed in nuclear applications due to tantalum's properties, where its hydride form can be used in moderation or shielding.
• Fuel Cell Components: Explored in the development of components for next-generation proton-exchange membrane (PEM) and solid-oxide fuel cells.
• Additive Manufacturing: Incorporated into metal powder feedstocks for 3D printing of complex, high-performance components requiring tantalum's properties.

Basic Information

Product Name	Tantalum Hydride
CAS No.	13981-95-8
Molecular Formula	Typically TaHx (x varies; common forms include TaH, TaH0.5)
Molecular Weight	Varies by stoichiometry (e.g., TaH ≈ 182.95 g/mol)
Synonyms	Tantalum Monohydride; Tantalum(I) Hydride; Tantalum Dihydride; Hydrogen Tantalum Alloy; Tantalum-Hydrogen Alloy; TaH; TaH2; Tantalum Hydride (TaH0.5)
EINECS	Contact for details

Quality Control

Our Tantalum Hydride is produced and handled under stringent quality management protocols to ensure batch-to-batch consistency and reliability. Each lot undergoes comprehensive analysis, including determination of hydrogen content, metallic purity, and phase identification via X-ray diffraction (XRD). A Certificate of Analysis (COA) detailing specific results for key parameters is provided with every shipment. We support compliance with relevant material standards for research and industrial applications.

Storage

Preserve in a tightly closed container, protected from light. Due to its hygroscopic (moisture-sensitive) and easily oxidized nature, this material must be stored under an inert atmosphere (argon or nitrogen) in a cool, dry place. Recommended storage temperature is 15-25°C. The container should be kept sealed in a dry, inert environment to prevent degradation from air and moisture exposure.

Specification

Item	Specification
Appearance	Gray to black powder or solid
Identification (XRD)	Conforms to structure
Assay (Tantalum content)	≥ 95.0%
Hydrogen Content	Specified per grade (Typ. 0.5 - 2.0% w/w)
Particle Size (D50)	Customizable (e.g., < 45 µm)
Metallic Impurities (ICP-OES)	≤ 0.5% total
Oxygen Content	≤ 1.0%
Nitrogen Content	≤ 0.5%

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.