Description

Tantalum(V) 2,2,2-Trifluoroethoxide is a highly specialized organometallic compound, serving as a critical precursor in advanced materials synthesis. Its value lies in providing a controlled source of tantalum and fluorine for depositing high-performance tantalum oxide and fluoride-based thin films. This chemical is essential for manufacturers and R&D facilities in the semiconductor, optical coating, and specialty ceramics industries seeking to enhance material properties at the nanoscale.

Application

• Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD): A key precursor for depositing high-κ tantalum oxide (Ta2O5) and tantalum fluoride thin films in semiconductor gate dielectrics and memory devices.
• Optical Coatings: Used to fabricate anti-reflective, high-index, and protective coatings for precision lenses, laser optics, and optical sensors.
• Specialty Ceramics and Composites: Acts as a doping agent or sintering aid to improve the dielectric, thermal, and mechanical properties of advanced ceramic materials.
• Catalysis Research: Employed as a catalyst precursor in organic synthesis and polymerization reactions, particularly where fluorine incorporation is desired.
• Surface Functionalization: Used to modify material surfaces to impart specific chemical resistance, adhesion, or electronic characteristics.

Basic Information

Product Name	Tantalum(V) 2,2,2-Trifluoroethoxide
CAS No.	13053-54-8
Molecular Formula	C10H15F15O5Ta
Molecular Weight	708.11 g/mol
Synonyms	Tantalum Penta(2,2,2-trifluoroethoxide); Penta(2,2,2-trifluoroethoxy)tantalum; Tantalum(V) trifluoroethoxide; Ta(OCH2CF3)5; Tantalum alkoxide (trifluoro); 2,2,2-Trifluoroethanol tantalum(V) salt
EINECS	Contact for details

Quality Control

Every batch of Tantalum(V) 2,2,2-Trifluoroethoxide is manufactured and tested under strict quality management systems. We ensure product integrity through rigorous analytical protocols, including NMR, ICP-MS, and Karl Fischer titration, to meet the exacting standards required for electronic and optical applications. A comprehensive Certificate of Analysis (COA) detailing purity, metal content, and impurity profiles is provided with each shipment to guarantee traceability and compliance.

Storage

Preserve in a tightly closed container, protected from light. Due to its hygroscopic and highly volatile nature, this material must be stored under an inert atmosphere (argon or nitrogen) in a cool, dry, and well-ventilated area. Recommended long-term storage temperature is 2-8°C. Allow the sealed container to reach room temperature before opening to minimize moisture ingress and pressure changes.

Specification

Item	Specification
Appearance	Colorless to pale yellow liquid
Identification (NMR)	Conforms to structure
Purity (NMR / GC)	≥ 99.0%
Tantalum (Ta) Content	25.0 - 26.5 %
Fluorine (F) Content	39.0 - 40.5 %
Trace Metals (ICP-MS)	≤ 10 ppm total
Water Content (Karl Fischer)	≤ 100 ppm

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.