Description

Nickel Silicide is an important intermetallic compound with significant utility in advanced materials and electronics manufacturing. Its unique combination of metallic conductivity and thermal stability makes it a critical material for creating reliable, high-performance components. This product is essential for industries focused on semiconductor fabrication, specialized metallurgy, and the development of high-temperature coatings and barrier layers.

Application

• Semiconductor Manufacturing: Used as a contact material and diffusion barrier in integrated circuits (ICs) and microelectromechanical systems (MEMS).
• Thin Film Deposition: A target material for physical vapor deposition (PVD) processes to create conductive and protective coatings.
• High-Temperature Alloys: Acts as a strengthening agent and modifier in nickel-based superalloys for aerospace and energy applications.
• Thermoelectric Materials: Investigated for use in thermoelectric generators due to its favorable electrical and thermal properties.
• Catalysis Research: Employed as a catalyst or catalyst support in certain hydrogenation and reforming reactions.
• Joining and Brazing: Used in specialized brazing alloys for joining refractory metals and ceramics.

Basic Information

Product Name	Nickel Silicide
CAS No.	12201-89-7
Molecular Formula	NiSi (common phase)
Molecular Weight	86.78 g/mol (for NiSi)
Synonyms	Nickel Monosilicide; Silicon Nickel; Nickel Silicon Alloy; NiSi; Ni2Si; NiSi2; Nickel Silicide Sputtering Target; Nickel Silicon Intermetallic
EINECS	Contact for details

Quality Control

Our Nickel Silicide is produced and handled under a stringent quality management system to ensure batch-to-batch consistency and performance reliability. Product quality is verified through advanced analytical techniques including X-ray diffraction (XRD) for phase identification and inductively coupled plasma (ICP) analysis for elemental purity. A comprehensive Certificate of Analysis (COA) detailing lot-specific results is provided with every shipment.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated area at room temperature (15-25°C). Keep the container tightly sealed to minimize exposure to atmospheric moisture and oxygen. Incompatible materials should be stored separately.

Specification

Item	Specification
Appearance	Gray to black powder or solid pieces
Primary Phase (XRD)	NiSi / Ni2Si / NiSi2 (as specified)
Nickel (Ni) Content	≥ 99% (on metallic basis)
Particle Size (for powder)	Customizable (e.g., -100 mesh, -325 mesh)
Trace Metals (ICP)	≤ 1000 ppm total
Oxygen Content	≤ 1.0%

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.