Description

Tantalum Silicide CAS NO 12039-79-1 is a high-performance intermetallic compound known for its exceptional thermal stability, oxidation resistance, and electrical conductivity. This material is critical for applications demanding reliability under extreme conditions, such as in high-temperature furnaces and advanced semiconductor manufacturing. It serves as a key component for industries including aerospace, electronics, and specialized metallurgy, where material integrity is paramount.

Application

• Diffusion Barrier Layers: Used in integrated circuits to prevent intermigration between silicon substrates and conductive metal layers.
• High-Temperature Heating Elements: Essential for furnace components and industrial heating systems operating in oxidizing atmospheres.
• Protective Coatings: Applied to turbine blades and other aerospace components to enhance oxidation and wear resistance.
• Thin Film Deposition: Serves as a sputtering target for physical vapor deposition (PVD) processes in microelectronics.
• Reinforcement Material: Incorporated into metal-matrix and ceramic-matrix composites to improve mechanical strength and thermal properties.
• Schottky Diodes and Contacts: Utilized in semiconductor devices for forming stable, low-resistance electrical contacts.

Basic Information

Product Name	Tantalum Silicide
CAS No.	12039-79-1
Molecular Formula	TaSi2
Molecular Weight	237.12 g/mol
Synonyms	Tantalum disilicide; Tantalum(IV) silicide; Silaneylidynetantalum; TaSi2; UNII-9F8M5A5K3T; EINECS 234-900-3
EINECS	234-900-3

Quality Control

Our Tantalum Silicide is manufactured under stringent process controls to ensure batch-to-batch consistency and high purity. Quality is verified through advanced analytical techniques including X-ray diffraction (XRD) for phase identification and inductively coupled plasma (ICP) analysis for metallic impurities. A Certificate of Analysis (COA) detailing lot-specific results is provided with every shipment to guarantee compliance with your technical requirements.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, well-ventilated area at room temperature (15-25°C). The product is stable under inert conditions but should be kept away from strong acids and strong oxidizing agents. Due to its fine particulate nature, avoid creating dust and handle in accordance with good industrial hygiene and safety practice.

Specification

Item	Specification
Appearance	Gray to black powder
Identification (XRD)	Conforms to TaSi2 structure
Assay (TaSi2)	≥ 99.5%
Particle Size (D50)	1-10 µm (customizable)
Metallic Impurities (ICP)	≤ 500 ppm total
Oxygen Content	≤ 0.5%
Nitrogen Content	≤ 0.1%
Bulk Density	Contact for details

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.