Description

Indium Zinc Oxide (IZO) Sputtering Targets are high-purity, ceramic materials engineered for advanced thin-film deposition processes. This compound is critical for producing transparent conductive oxide (TCO) films with superior electrical and optical properties compared to traditional materials. It is essential for manufacturers in the electronics and display industries seeking to enhance device performance and enable next-generation flexible and transparent technologies.

Application

• Deposition of transparent conductive films for touch-sensitive displays, LCDs, and OLEDs.
• Fabrication of electrodes for thin-film solar cells and other photovoltaic devices.
• Production of flexible and wearable electronics due to its excellent performance on plastic substrates.
• Manufacturing of electrochromic windows and smart glass applications.
• Use in organic light-emitting diodes (OLEDs) as a hole injection layer or anode.
• Application in sensors and transparent electromagnetic shielding.

Basic Information

Product Name	Indium Zinc Oxide (IZO) Sputtering Targets
CAS No.	12031-17-3
Molecular Formula	Typically In2O3-ZnO (variable composition)
Molecular Weight	Varies by stoichiometry
Synonyms	IZO Target; Indium Zinc Oxide Ceramic Target; Indium Zinc Oxide Sputtering Target; Zinc Indium Oxide; Transparent Conductive Oxide Target; IZO (In-Zn-O); Indium Zinc Trioxide; Amorphous Oxide Semiconductor Target
EINECS	Contact for details

Quality Control

Our Indium Zinc Oxide Sputtering Targets are manufactured under controlled conditions to ensure exceptional purity, density, and microstructural homogeneity. Each production lot undergoes rigorous testing, including chemical composition analysis, density measurement, and microstructure evaluation. Certificates of Analysis (COA) detailing lot-specific properties are available upon request to support your quality assurance protocols.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated area at room temperature (15-25°C). The targets should be handled with care to avoid chipping or contamination and kept in a clean, low-humidity environment prior to use.

Specification

Item	Specification
Appearance	Dense, sintered ceramic disc/tile
Composition (In:Zn:O ratio)	Customizable (e.g., In2O3:ZnO 90:10 wt%)
Purity	> 99.99% (4N) or > 99.9% (3N)
Density	> 95% of theoretical density
Relative Density	> 6.5 g/cm³
Grain Size	< 10 µm (typical)
Electrical Resistivity (of deposited film)	~ 3-5 x 10-4 ω·cm
Packaging	Individually packed in cleanroom-grade materials

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.