Description

Tetrakis(Dimethylamino)Silane is a highly reactive organosilicon compound that serves as a versatile precursor for silicon-containing materials. Its significance lies in its ability to act as a high-purity silicon and nitrogen source for advanced thin-film deposition processes. This product is essential for manufacturers and R&D facilities in the semiconductor, electronics, and specialty chemical industries seeking to develop or produce high-performance coatings and nanomaterials.

Application

• Semiconductor Manufacturing: As a key precursor for Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD) of silicon nitride (SiN) and silicon carbonitride (SiCN) thin films for gate dielectrics and diffusion barriers.
• Electronics & Optoelectronics: Used in the fabrication of insulating and passivation layers for microelectronic devices, LEDs, and photovoltaic cells.
• Surface Modification & Coatings: Employed as a silylating agent to modify surface properties of metals, glass, and polymers, enhancing adhesion, hydrophobicity, or corrosion resistance.
• Polymer & Resin Synthesis: Acts as a monomer or cross-linking agent in the synthesis of specialty silicones, polycarbosilazanes, and pre-ceramic polymers.
• Catalysis & Chemical Synthesis: Serves as a reagent in organic synthesis for introducing silicon and dimethylamino functional groups.
• Research & Development: A critical material for academic and industrial R&D focused on novel silicon-based nanomaterials, ceramics, and composites.

Basic Information

Item	Information
Product Name	Tetrakis(Dimethylamino)Silane
CAS No.	1624-01-7
Molecular Formula	C8H24N4Si
Molecular Weight	204.39 g/mol
Synonyms	Tetrakis(dimethylamino)silane; Silicon tetrakis(dimethylamide); Tetrakisdimethylaminosilane; TDMAS; Si(NMe2)4; N,N,N',N',N'',N''',N''',N'''-Octamethylsilanetetramine; Silane, tetrakis(dimethylamino)-
EINECS	Contact for details

Quality Control

Our Tetrakis(Dimethylamino)Silane is produced and handled under stringent quality management protocols to ensure batch-to-batch consistency and high purity, critical for sensitive deposition processes. We provide comprehensive Certificates of Analysis (COA) with each shipment, detailing key parameters such as purity, identity, and impurity profiles. Our quality systems are designed to meet the exacting standards of the electronics and semiconductor industries.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated area at room temperature (15-25°C). Due to its highly volatile and hygroscopic (moisture-sensitive) nature, containers must be kept tightly sealed under an inert atmosphere (e.g., nitrogen or argon) after opening to prevent decomposition and maintain purity. Keep away from heat, sparks, open flames, and incompatible materials such as strong acids and oxidizers.

Specification

Item	Specification
Appearance	Colorless to pale yellow liquid
Identification (IR)	Conforms
Assay (GC)	≥ 98.0%
Density (at 20°C)	~0.85 g/mL
Refractive Index (n20D)	~1.43
Moisture (Karl Fischer)	≤ 0.1%
Metal Impurities (ICP-MS)	≤ 10 ppm total

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.