Description

Triphenylsulfonium Hexafluorophosphate is a high-purity photoacid generator (PAG) salt, a critical component in advanced photoresist formulations. Its primary value lies in its ability to generate strong acids upon exposure to specific light sources, initiating the chemical reactions necessary for precise pattern development. This compound is essential for manufacturers in the semiconductor, microelectronics, and advanced printing industries who require reliable and efficient photoacid generators for deep-UV (DUV) and other photolithographic processes.

Application

• Semiconductor Photolithography: A key photoacid generator (PAG) in chemically amplified resists (CARs) for deep-UV (DUV), extreme-UV (EUV), and i-line photolithography processes.
• Microelectronics Fabrication: Used in the production of integrated circuits (ICs), printed circuit boards (PCBs), and other microelectronic components requiring high-resolution patterning.
• Advanced Printing Plates: Employed in the formulation of photopolymer plates for high-fidelity digital and offset printing.
• UV-Curing Systems: Acts as an efficient cationic photoinitiator in coatings, inks, and adhesives that cure upon exposure to ultraviolet light.
• Polymer Chemistry Research: Serves as a catalyst or initiator in academic and industrial research for developing novel polymers and functional materials.
• Specialty Chemical Synthesis: Utilized as a reagent or catalyst in organic synthesis, particularly in reactions requiring acid generation under mild conditions.

Basic Information

Item	Details
Product Name	Triphenylsulfonium Hexafluorophosphate
CAS No.	57835-99-1
Molecular Formula	C18H15F6PS
Molecular Weight	408.34 g/mol
Synonyms	Triphenylsulfonium PF6; TPS-PF6; Triphenylsulfonium Hexafluorophosphate Salt; Photoacid Generator PAG; Sulfonium Salt; (Phenylsulfonio)triphenyl-λ5-sulfanuide Hexafluorophosphate(1-); Triphenylsulfonium Hexafluorophosphate(1-)
EINECS	Contact for details

Quality Control

Our Triphenylsulfonium Hexafluorophosphate is manufactured under strict quality management systems. Each batch undergoes rigorous analytical testing, including HPLC for purity, NMR for structural confirmation, and ICP-MS for trace metal analysis, to ensure it meets the exacting standards required for photolithographic applications. A comprehensive Certificate of Analysis (COA) detailing purity, assay, and impurity profiles is provided with every shipment.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated area at a controlled room temperature (15-25°C). This product is hygroscopic (moisture-sensitive) and must be kept under dry, inert conditions to prevent decomposition. Keep away from strong bases and incompatible materials.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to structure
Assay (HPLC)	≥ 99.0%
Melting Point	245 - 250 °C (dec.)
Water Content (KF)	≤ 0.5%
Residue on Ignition	≤ 0.1%
Heavy Metals (as Pb)	≤ 10 ppm
Chloride (Cl)	≤ 50 ppm

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.