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Bis(Dimethylamino-2-Methyl-2-Butoxo)Nickel CAS NO 942311-35-5
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CAS No.:942311-35-5
Grade:Pharmacy Grade
Content:99.9%
Brand:Customizable
Packaging:Customizable
Description
Bis(Dimethylamino-2-Methyl-2-Butoxo)Nickel is a high-purity organonickel compound, specifically a nickel(II) β-diketonate derivative, valued for its role as a precursor in advanced material synthesis. This compound is essential for depositing high-quality nickel-containing thin films with precise stoichiometric control. It is primarily required by manufacturers and R&D facilities in the semiconductor, catalysis, and specialty chemical sectors for applications demanding ultra-pure metal sources.
Application
- Chemical Vapor Deposition (CVD) & Atomic Layer Deposition (ALD): Serves as a critical nickel precursor for depositing nickel, nickel oxide, or nickel alloy thin films on substrates for microelectronics and coatings.
- Catalyst Synthesis: Used as a starting material or catalyst component in organic synthesis and polymerization reactions.
- Advanced Material Research: Employed in laboratories for developing novel nanomaterials, metal-organic frameworks (MOFs), and functional ceramics.
- Surface Modification: Facilitates the creation of nickel-based surface layers to enhance conductivity, corrosion resistance, or catalytic activity.
- Plating & Electroless Deposition: Acts as a source of nickel in specialized electrochemical and electroless plating formulations.
Basic Information
| Product Name | Bis(Dimethylamino-2-Methyl-2-Butoxo)Nickel |
| CAS No. | 942311-35-5 |
| Molecular Formula | C14H30N2NiO2 |
| Molecular Weight | 317.10 g/mol |
| Synonyms | Nickel(II) 2-(Dimethylamino)-2-methyl-3-butanoate; Nickel bis(2-(dimethylamino)-2-methyl-3-oxobutanoate); (Dimethylamino-2-methyl-2-butoxo)nickel; Ni(dmamb)2; Organonickel Precursor; Nickel CVD Precursor; ALD Nickel Source; Nickel β-ketoiminate |
| EINECS | Contact for details |
Quality Control
Our Bis(Dimethylamino-2-Methyl-2-Butoxo)Nickel is manufactured under controlled conditions to ensure batch-to-batch consistency and high purity suitable for demanding applications like semiconductor fabrication. Quality is verified through analytical techniques including NMR, ICP-MS, and Karl Fischer titration. A Certificate of Analysis (COA) detailing purity, metal content, and impurity profiles is provided with each shipment to support your quality assurance protocols.
Storage
Preserve in a tightly closed container, protected from light. Store in a cool, dry place at room temperature (15-25°C) under an inert atmosphere (e.g., nitrogen or argon) due to its sensitivity to moisture and oxidation. Keep away from heat and incompatible materials.
Specification
| Item | Specification |
|---|---|
| Appearance | Green to blue-green solid or crystalline powder |
| Identification (IR) | Conforms to structure |
| Assay (Ni content) | ≥ 18.5% (by ICP-OES) |
| Purity (HPLC/GC) | ≥ 99.0% |
| Moisture Content (KF) | ≤ 0.5% |
| Metal Impurities (ICP-MS) | Individual ≤ 50 ppm, Total ≤ 200 ppm |
Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.
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