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Bis(Dimethylamino-2-Methyl-2-Butoxo)Nickel CAS NO 942311-35-5


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CAS No.:942311-35-5

Grade:Pharmacy Grade

Content:99.9%

Brand:Customizable

Packaging:Customizable

Description

Bis(Dimethylamino-2-Methyl-2-Butoxo)Nickel is a high-purity organonickel compound, specifically a nickel(II) β-diketonate derivative, valued for its role as a precursor in advanced material synthesis. This compound is essential for depositing high-quality nickel-containing thin films with precise stoichiometric control. It is primarily required by manufacturers and R&D facilities in the semiconductor, catalysis, and specialty chemical sectors for applications demanding ultra-pure metal sources.

Application

  • Chemical Vapor Deposition (CVD) & Atomic Layer Deposition (ALD): Serves as a critical nickel precursor for depositing nickel, nickel oxide, or nickel alloy thin films on substrates for microelectronics and coatings.
  • Catalyst Synthesis: Used as a starting material or catalyst component in organic synthesis and polymerization reactions.
  • Advanced Material Research: Employed in laboratories for developing novel nanomaterials, metal-organic frameworks (MOFs), and functional ceramics.
  • Surface Modification: Facilitates the creation of nickel-based surface layers to enhance conductivity, corrosion resistance, or catalytic activity.
  • Plating & Electroless Deposition: Acts as a source of nickel in specialized electrochemical and electroless plating formulations.

Basic Information

Product Name Bis(Dimethylamino-2-Methyl-2-Butoxo)Nickel
CAS No. 942311-35-5
Molecular Formula C14H30N2NiO2
Molecular Weight 317.10 g/mol
Synonyms Nickel(II) 2-(Dimethylamino)-2-methyl-3-butanoate; Nickel bis(2-(dimethylamino)-2-methyl-3-oxobutanoate); (Dimethylamino-2-methyl-2-butoxo)nickel; Ni(dmamb)2; Organonickel Precursor; Nickel CVD Precursor; ALD Nickel Source; Nickel β-ketoiminate
EINECS Contact for details

Quality Control

Our Bis(Dimethylamino-2-Methyl-2-Butoxo)Nickel is manufactured under controlled conditions to ensure batch-to-batch consistency and high purity suitable for demanding applications like semiconductor fabrication. Quality is verified through analytical techniques including NMR, ICP-MS, and Karl Fischer titration. A Certificate of Analysis (COA) detailing purity, metal content, and impurity profiles is provided with each shipment to support your quality assurance protocols.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry place at room temperature (15-25°C) under an inert atmosphere (e.g., nitrogen or argon) due to its sensitivity to moisture and oxidation. Keep away from heat and incompatible materials.

Specification

Item Specification
Appearance Green to blue-green solid or crystalline powder
Identification (IR) Conforms to structure
Assay (Ni content) ≥ 18.5% (by ICP-OES)
Purity (HPLC/GC) ≥ 99.0%
Moisture Content (KF) ≤ 0.5%
Metal Impurities (ICP-MS) Individual ≤ 50 ppm, Total ≤ 200 ppm

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.

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