Description

Bis(Trimethylsilyl)Amidohafnium(IV) Chloride is a highly specialized organohafnium compound that serves as a crucial precursor in advanced materials synthesis. Its value lies in its ability to act as a volatile, reactive source of hafnium for high-purity thin film deposition processes. This chemical is essential for manufacturers and R&D facilities in the semiconductor and nanotechnology sectors, where precise control over material composition at the atomic level is required.

Application

• Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD): As a key precursor for depositing hafnium-based high-κ dielectric films in next-generation semiconductor devices.
• Advanced Ceramics and Nanomaterials: Used in the synthesis of hafnium nitride, hafnium carbide, and other refractory ceramic materials for coatings and composites.
• Catalysis Research: Acts as a catalyst or catalyst precursor in specialized organic transformations and polymerization reactions.
• Optical and Electronic Coatings: For creating thin films with specific refractive indices or electrical properties in optoelectronic components.
• Polymer Modification: Employed to introduce hafnium centers into polymer matrices for creating materials with enhanced thermal or mechanical properties.

Basic Information

Product Name	Bis(Trimethylsilyl)Amidohafnium(IV) Chloride
CAS No.	70969-29-8
Molecular Formula	C6H18ClHfNSi2
Molecular Weight	378.37 g/mol
Synonyms	Bis(trimethylsilyl)amidohafnium chloride; Hafnium(IV) bis(trimethylsilyl)amide chloride; Chlorobis(trimethylsilyl)amidohafnium; Hf[N(SiMe3)2]2Cl2; Hf(BTMSA)2Cl2; Hafnium bis(trimethylsilyl)amide dichloride; (TMS)2NHfCl2
EINECS	Contact for details

Quality Control

Our Bis(Trimethylsilyl)Amidohafnium(IV) Chloride is produced and handled under stringent inert atmosphere conditions to ensure purity and consistency. Each batch undergoes rigorous analytical testing, including NMR, elemental analysis (C/H/N), and trace metal analysis, to meet the exacting standards required for semiconductor-grade precursors. A comprehensive Certificate of Analysis (COA) detailing purity, identity, and impurity profiles is provided with every shipment.

Storage

Preserve in a tightly closed container, protected from light. Store under a dry, inert atmosphere (argon or nitrogen) at temperatures between 2°C and 8°C. This material is both hygroscopic and easily oxidized; exposure to air or moisture must be strictly avoided to prevent decomposition. Storage areas should be cool, dry, and well-ventilated.

Specification

Item	Specification
Appearance	White to off-white crystalline solid or powder
Identification (IR)	Conforms to structure
Assay (Hf content)	≥ 47.0 %
Purity (NMR)	≥ 99.0 %
Chloride Content	18.0 - 19.5 %
Trace Metals (ICP-MS)	≤ 50 ppm total

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.