Description

(tert-Butylimino)Tris(Dimethylamino)Tantalum is a high-purity organometallic compound used as a precursor in advanced material deposition processes. This compound is critical for applications requiring precise, uniform, and high-quality tantalum-containing thin films. It is primarily utilized by manufacturers and research institutions in the semiconductor, electronics, and nanotechnology sectors.

Application

• Atomic Layer Deposition (ALD): A key precursor for depositing tantalum nitride (TaN) and tantalum oxide (Ta2O5) thin films as diffusion barriers and high-k dielectrics in semiconductor devices.
• Chemical Vapor Deposition (CVD): Used in CVD processes for creating uniform, conformal coatings on complex geometries for microelectronics and optical applications.
• Semiconductor Fabrication: Essential for manufacturing integrated circuits, memory chips, and logic devices where ultra-thin, high-performance barrier layers are required.
• Advanced Coatings: Enables the production of wear-resistant, corrosion-resistant, or optically active coatings on various substrates.
• Research & Development: Serves as a starting material in academic and industrial labs for developing new materials, catalysts, and deposition techniques.
• Nanotechnology: Facilitates the controlled growth of nanostructures and nanocomposite materials with tailored electronic properties.

Basic Information

Product Name	(tert-Butylimino)Tris(Dimethylamino)Tantalum
CAS No.	69039-11-8
Molecular Formula	C14H36N6Ta
Molecular Weight	469.43 g/mol
Synonyms	Tris(dimethylamido)(tert-butylimido)tantalum(V); TBTDMT; TBTEMT; Ta(NtBu)(NMe2)3; tert-Butylimido-tris(dimethylamido)tantalum; (tert-Butylimido)tris(dimethylamido)tantalum; Tantalum(V) tert-butylimide tris(dimethylamide); Tert-Butylimido Tris(Dimethylamido)Tantalum
EINECS	Contact for details

Quality Control

Our (tert-Butylimino)Tris(Dimethylamino)Tantalum is manufactured under stringent conditions to ensure high purity and batch-to-batch consistency, meeting the rigorous demands of the electronics industry. Each lot is supported by a comprehensive Certificate of Analysis (COA) detailing purity, identity, and impurity profiles. We adhere to strict quality management protocols to guarantee material integrity for sensitive deposition processes.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated area at room temperature (15-25°C). This product is hygroscopic (moisture-sensitive) and must be handled under an inert atmosphere (e.g., nitrogen or argon) to prevent degradation. Keep away from incompatible materials.

Specification

Item	Specification
Appearance	Colorless to pale yellow liquid
Identification (IR)	Conforms to structure
Assay (NMR/Titration)	≥ 99.0%
Density (at 20°C)	~1.2 g/cm³
Metal Impurities (ICP-MS)	< 10 ppm total
Chloride Content	< 50 ppm

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.