Description

Tetrakis(Ethylmethylamino)Hafnium is a highly specialized organometallic compound, primarily used as a precursor for the deposition of hafnium-containing thin films. This compound matters for its critical role in enabling the production of advanced semiconductor devices and high-performance optical coatings. It is essential for manufacturers in the electronics, semiconductor, and specialty materials sectors who require high-purity deposition sources for atomic layer deposition (ALD) and chemical vapor deposition (CVD) processes.

Application

• Primary precursor for Atomic Layer Deposition (ALD) of hafnium oxide (HfO₂) high-k dielectric films in semiconductor manufacturing.
• Key source material for Chemical Vapor Deposition (CVD) processes to create hafnium-based coatings for optical and electronic applications.
• Essential in the fabrication of advanced logic and memory chips, including DRAM and next-generation nodes.
• Used in the production of protective and anti-reflective coatings for precision optics and laser components.
• Enables research and development of novel nanoscale materials and thin-film structures in advanced material science.
• Potential applications in catalysis research due to its reactive hafnium-nitrogen bonds.

Basic Information

Product Name	Tetrakis(Ethylmethylamino)Hafnium
CAS No.	352535-01-4
Molecular Formula	C12H32HfN4
Molecular Weight	398.91 g/mol
Synonyms	TEMAH; Hafnium(IV) tetrakis(ethylmethylamide); Hafnium N,N'-Ethylmethylamide; Tetrakis(ethylmethylamido)hafnium(IV); Hf(NEtMe)4; Hafnium precursor for ALD; Hf TEMAH; Hafnium tetraethylmethylamide
EINECS	Contact for details

Quality Control

Our Tetrakis(Ethylmethylamino)Hafnium is produced and handled under strict quality management systems to meet the exacting standards of the semiconductor industry. Each batch is analyzed to ensure high purity and consistency, with trace metal analysis performed to meet stringent particle and contamination control requirements. Certificates of Analysis (COA) with full analytical data, including assay and impurity profiles, are provided and can be tailored to meet specific customer quality assurance protocols.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated place at temperatures recommended for highly volatile, moisture-sensitive organometallics (typically below 10°C or as specified). The container must be kept under an inert atmosphere (argon or nitrogen) to prevent degradation due to its hygroscopic and oxygen-sensitive nature.

Specification

Item	Specification
Appearance	Clear, colorless to pale yellow liquid
Identification (IR)	Conforms to reference spectrum
Assay (Hf content)	> 99.9% (metals basis)
Purity (HPLC)	> 99.5%
Density (at 20°C)	~1.2 g/mL
Volatile Residuals (GC)	< 0.5%
Trace Metals (ICP-MS)	Individual metals < 10 ppm

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.