Description

Bis(Mu-Dimethylamino)Tetrakis(Dimethylamino)Dialuminum is a highly reactive organoaluminum compound primarily used as a precursor in advanced materials synthesis. This compound matters for its role as a volatile, nitrogen-containing source of aluminum, enabling precise deposition in thin-film and semiconductor manufacturing processes. It is critically needed by researchers and manufacturers in the electronics, optoelectronics, and specialty chemical sectors for applications requiring high-purity aluminum nitride or oxide films.

Application

• Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD): Serves as a key aluminum precursor for depositing high-purity aluminum nitride (AlN) and aluminum oxide (Al2O3) thin films.
• Semiconductor Fabrication: Used in the production of insulating layers, gate dielectrics, and protective coatings for microelectronic devices.
• Optoelectronic Materials: Enables the growth of III-nitride materials for LEDs, laser diodes, and high-power electronic devices.
• Catalysis Research: Acts as a catalyst or catalyst precursor in specialized organic transformations and polymerization reactions.
• Advanced Ceramics: A starting material for the synthesis of aluminum-based ceramic powders and nanocomposites.
• Surface Modification: Used to create functionalized surfaces with specific chemical properties for sensors or adhesion promotion.

Basic Information

Product Name	Bis(Mu-Dimethylamino)Tetrakis(Dimethylamino)Dialuminum
CAS No.	32093-39-3
Molecular Formula	C12H36Al2N6
Molecular Weight	318.43 g/mol
Synonyms	Hexakis(dimethylamido)dialuminum; Tetrakis(dimethylamido)-μ-dimethylamido-dialuminum; Dialuminum hexakis(dimethylamide); Aluminum amide ((Al(N(CH3)2)3)2); TMA-DMA; Al2(NMe2)6; Aluminum(III) dimethylamide trimer; Aluminum nitride precursor
EINECS	Contact for details

Quality Control

Our Bis(Mu-Dimethylamino)Tetrakis(Dimethylamino)Dialuminum is produced and handled under stringent conditions to ensure batch-to-batch consistency and high purity suitable for demanding deposition processes. Quality is verified through comprehensive analytical techniques including NMR, GC-MS, and elemental analysis. Certificates of Analysis (COA) detailing purity, identity, and impurity profiles are provided with every shipment to support your quality assurance protocols.

Storage

Preserve in a tightly closed container, protected from light. Due to its highly hygroscopic and pyrophoric nature, this material must be stored under an inert atmosphere (argon or nitrogen) in a cool, dry, and well-ventilated area. Recommended storage temperature is 2-8°C. Keep away from heat, sparks, open flames, and oxidizing agents.

Specification

Item	Specification
Appearance	Colorless to pale yellow liquid / solid
Identification (NMR)	Conforms to structure
Purity (GC)	≥ 98.0%
Aluminum Content	Contact for details
Volatile Impurities (GC)	≤ 1.0%

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.