Description

Hafnium tert-Butoxide is a high-purity metal-organic compound, specifically a hafnium alkoxide, widely used as a precursor in advanced material synthesis. Its primary value lies in delivering controlled, high-quality hafnium oxide films, which are critical for performance and miniaturization in modern electronics. This product is essential for manufacturers and R&D teams in the semiconductor, optical coating, and specialty ceramics industries seeking reliable, high-purity precursors for thin-film deposition processes. CAS No. 2172-02-3.

Application

• Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD) precursor for high-k dielectric hafnium oxide (HfO₂) films in semiconductor gate stacks.
• Fabrication of optical coatings and thin films with specific refractive indices for lenses, lasers, and anti-reflective surfaces.
• Precursor material in Sol-Gel processes for producing high-purity hafnium-based ceramics and advanced oxides.
• Catalyst or catalyst precursor in specialized organic synthesis and polymerization reactions.
• Starting material for the synthesis of other hafnium-containing coordination compounds and nanomaterials.
• Research and development of next-generation electronic materials, including ferroelectric and memory devices.

Basic Information

Item	Detail
Product Name	Hafnium tert-Butoxide
CAS No.	2172-02-3
Molecular Formula	C16H36HfO4
Molecular Weight	450.93 g/mol
Synonyms	Hafnium(IV) tert-butoxide; Hafnium tetra-tert-butoxide; tert-Butoxyhafnium; Hafnium butoxide; Tetrakis(tert-butoxy)hafnium; Hf(OtBu)4; Hafnium(4+) tetra(tert-butanolate); Hafnium tert-butanolate
EINECS	Contact for details

Quality Control

Our Hafnium tert-Butoxide is produced and handled under stringent quality management protocols to ensure batch-to-batch consistency and high purity, typically meeting standards suitable for electronic and optical applications. Each lot is accompanied by a comprehensive Certificate of Analysis (COA) detailing key parameters such as hafnium content, trace metal impurities, and solvent residues. We support customer-specific purity requirements and can provide material tailored to your application's specifications.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated area at room temperature (15-25°C). This material is hygroscopic (moisture-sensitive) and must be handled under an inert atmosphere (e.g., nitrogen or argon) to prevent degradation. Keep away from strong acids and oxidizing agents.

Specification

Item	Specification
Appearance	White to off-white powder or crystals
Identification (IR)	Conforms to structure
Assay (Hf content)	≥ 99.9% (metals basis)
Purity (HPLC/GC)	≥ 99.5%
Trace Metals (ICP-MS)	< 100 ppm total
Chloride (Cl)	< 50 ppm
Solvent Residue	Contact for details

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.