Description

(2,2,6,6-Tetramethyl-3,5-Heptanedionato)Thallium(I) CAS NO 133892-72-5 is a high-purity organothallium compound, specifically a thallium(I) β-diketonate complex. This material serves as a critical precursor in advanced materials science, particularly for the synthesis of specialty thin films via chemical vapor deposition (CVD) and atomic layer deposition (ALD) techniques. It is essential for researchers and manufacturers in the electronics and semiconductor industries developing novel electronic, optical, and superconducting materials.

Application

• Chemical Vapor Deposition (CVD) Precursor: A key source material for depositing thallium-containing thin films, such as thallium-based superconductors (e.g., Tl-Ba-Ca-Cu-O systems).
• Atomic Layer Deposition (ALD) Source: Used in the precise, layer-by-layer growth of complex oxide films for microelectronics and nanotechnology applications.
• Materials Research & Development: A vital reagent for synthesizing novel inorganic and organometallic compounds with specific magnetic or electronic properties.
• Dopant Source: Employed in the doping of semiconductor materials to modify their electrical characteristics.
• Catalysis Research: Investigated as a catalyst or catalyst precursor in specialized organic synthesis reactions.
• Optical Materials Fabrication: Potential use in creating materials with non-linear optical properties.

Basic Information

Item	Detail
Product Name	(2,2,6,6-Tetramethyl-3,5-Heptanedionato)Thallium(I)
CAS No.	133892-72-5
Molecular Formula	C11H19O2Tl
Molecular Weight	351.64 g/mol
Synonyms	Thallium(I) 2,2,6,6-tetramethyl-3,5-heptanedionate; Thallium(I) dipivaloylmethanate; Thallium tmhd; Tl(tmhd); Tl(dpm); Thallium(I) DPM; Thallium 2,2,6,6-tetramethylheptane-3,5-dionate; (thd)Thallium(I)
EINECS	Contact for details

Quality Control

Our (2,2,6,6-Tetramethyl-3,5-Heptanedionato)Thallium(I) is produced and handled under stringent quality management protocols to ensure batch-to-batch consistency and high purity, which is critical for reproducible results in thin film deposition processes. Each lot is analyzed, and a comprehensive Certificate of Analysis (COA) detailing purity, identity, and trace metal content is provided. We adhere to relevant standards for high-purity chemical precursors.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, well-ventilated place at room temperature (15-25°C). This compound is moisture-sensitive (hygroscopic) and should be handled under an inert atmosphere (e.g., nitrogen or argon) to prevent degradation. Keep away from strong acids and strong oxidizers.

Specification

Item	Specification
Appearance	White to off-white crystalline powder
Identification (IR)	Conforms to structure
Assay (Tl content)	≥ 98.0%
Purity (HPLC)	≥ 99.0%
Trace Metals (ICP-MS)	< 100 ppm total
Solubility	Soluble in organic solvents (e.g., toluene, THF)

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.