Description

Hafnium n-Butoxide is a high-purity metal-organic compound, specifically a hafnium alkoxide, with the CAS registry number 125211-21-4. This specialty chemical serves as a critical precursor for depositing high-performance hafnium oxide (HfO₂) thin films, which are essential for advanced electronic and optical applications. It is primarily utilized by manufacturers and R&D departments in the semiconductor, nanotechnology, and specialty ceramics industries seeking precise material deposition and superior film properties.

Application

• Atomic Layer Deposition (ALD) & Chemical Vapor Deposition (CVD): A key precursor for depositing high-k dielectric hafnium oxide films in next-generation semiconductor devices, including transistors and memory cells.
• Nanomaterial Synthesis: Used in the sol-gel synthesis of hafnium-based nanoparticles and nanostructured ceramics for catalytic and structural applications.
• Optical Coatings: Serves as a starting material for producing thin films with high refractive index for anti-reflective and protective optical coatings.
• Specialty Catalysts: Acts as a catalyst or catalyst component in specialized organic synthesis and polymerization reactions.
• Advanced Ceramics: A precursor for manufacturing high-temperature resistant hafnium carbide (HfC) or hafnium nitride (HfN) ceramics.
• Research & Development: Employed in academic and industrial labs for developing new materials in electronics, photonics, and energy storage.

Basic Information

Product Name	Hafnium n-Butoxide
CAS No.	125211-21-4
Molecular Formula	C₁₆H₃₆HfO₄
Molecular Weight	442.94 g/mol
Synonyms	Hafnium(IV) butoxide; Hafnium tetrabutoxide; Tetrakis(1-butanolato)hafnium; Butyl hafnate; Hafnium butylate; Hf(OBu)₄; Hf(OnBu)₄
EINECS	Contact for details

Quality Control

Our Hafnium n-Butoxide is manufactured under stringent conditions to ensure batch-to-batch consistency and high purity, typically meeting or exceeding 99.9% (metal basis). Quality is verified through advanced analytical techniques including Inductively Coupled Plasma Mass Spectrometry (ICP-MS), Nuclear Magnetic Resonance (NMR), and Karl Fischer titration. A comprehensive Certificate of Analysis (COA) detailing purity, trace metal impurities, and physical properties is provided with each shipment to guarantee compliance with your technical specifications.

Storage

Preserve in a tightly closed container, protected from light. Store in a cool, dry, and well-ventilated area at room temperature (15-25°C). This material is hygroscopic (moisture-sensitive) and must be handled under an inert atmosphere (argon or nitrogen) to prevent degradation. Keep away from heat, sparks, and open flames.

Specification

Item	Specification
Appearance	Colorless to pale yellow liquid
Assay (Hf basis)	≥ 99.9%
Identification (IR)	Conforms
Density (at 20°C)	~1.3 g/mL
Trace Metals (ICP-MS)	< 100 ppm total
Water Content (Karl Fischer)	< 0.1%

Note: Specifications can be tailored. Please contact us for the detailed technical data sheet of a specific grade.